Effect of Disorder and Defects in Ion-Implanted Semiconductors: Electrical and Physicochemical Characterization: Volume 45 - Rilegato

Rilegato

ISBN 10: 0127521453 ISBN 13: 9780127521459

Casa editrice: Academic Pr, 1997

Riassunto

Defects in ion-implanted semiconductors are important and will likely gain increased importance in the future as annealing temperatures are reduced with successive IC generations. Novel implant approaches, such as MdV implantation, create new types of defects whose origin and annealing characteristics will need to be addressed. Publications in this field mainly focus on the effects of ion implantation on the material and the modification in the implanted layer afterhigh temperature annealing.
Electrical and Physicochemical Characterization focuses on the physics of the annealing kinetics of the damaged layer. An overview of characterization tehniques and a critical comparison of the information on annealing kinetics is also presented.

Key Features
* Provides basic knowledge of ion implantation-induced defects
* Focuses on physical mechanisms of defect annealing
* Utilizes electrical and physico-chemical characterization tools for processed semiconductors
* Provides the basis for understanding the problems caused by the defects generated by implantation and the means for their characterization and elimination

Dettagli dell?edizione

• Editore: Academic Pr
• Data di pubblicazione: 1997
• Lingua: Inglese
• ISBN 10: 0127521453
• ISBN 13: 9780127521459
• Rilegatura: Copertina rigida
• Numero edizione: 1
• Numero di pagine: 300
• Redattore: Ghibaudo Gerard, Christofides Constantinos
• Contatto del produttore: non disponibile
• Persona responsabile: non disponibile