Handbook of Cleaning in Semiconductor Manufacturing: Fundamentals and Applications

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9780470625958: Handbook of Cleaning in Semiconductor Manufacturing: Fundamentals and Applications

This comprehensive volume provides an in-depth discussion of the fundamentals of cleaning and surface conditioning of semiconductor applications such as high-k/metal gate cleaning, copper/low-k cleaning, high dose implant stripping, and silicon and SiGe passivation. The theory and fundamental physics associated with wet etching and wet cleaning is reviewed, plus the surface and colloidal aspects of wet processing. Formulation development practices and methodology are presented along with the applications for preventing copper corrosion, cleaning aluminum lines, and other sensitive layers. This is a must-have reference for any engineer or manager associated with using or supplying cleaning and contamination free technologies for semiconductor manufacturing. From the Reviews..."This handbook will be a valuable resource for many academic libraries. Many engineering librarians who work with a variety of programs (including, but not limited to Materials Engineering) should include this work in their collection. My recommendation is to add this work to any collection that serves a campus with a materials/manufacturing/electrical/computer engineering programs and campuses with departments of physics and/or chemistry with large graduate-level enrollment." Randy Wallace, Department Head, Discovery Park Library, University of North Texas

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Recensione:

 
This handbook will be a valuable resource for many academic libraries. Many engineering librarians who work with a variety of programs (including, but not limited to Materials Engineering) should include this work in their collection. My recommendation is to add this work to any collection that serves a campus with a materials/manufacturing/electrical/computer engineering programs and campuses with departments of physics and/or chemistry with large graduate–level enrollment.  

––Randy Wallace, Department Head, Discovery Park Library, University of North Texas

L'autore:

Karen A. Reinhardt is Principle Consultant at Cameo Consulting in San Jose, California. Currently, Karen works with start–up cleaning companies to develop their technology for acquisition. Prior to forming a consulting company, Karen was employed at Novellus Systems, AMD, and Cypress Semiconductor. She has published more than 30 technical publications, has been awarded seven patents, and is co–editor of Handbook of Silicon Wafer Cleaning Technology.

Richard F. Reidy (Ph.D., Penn State) is interim Chair and associate professor of Material Science and Engineering at the University of North Texas. He has conducted research in interconnect processing and characterization with over 60 technical publications and three patents. He is a member of the International Technology Roadmap for Semiconductors.

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Karen A. Reinhardt
Editore: John Wiley and#38; Sons (2011)
ISBN 10: 0470625953 ISBN 13: 9780470625958
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Descrizione libro John Wiley and#38; Sons, 2011. HRD. Condizione libro: New. New Book.Shipped from US within 10 to 14 business days.THIS BOOK IS PRINTED ON DEMAND. Established seller since 2000. Codice libro della libreria IP-9780470625958

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Karen A. Reinhardt
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Descrizione libro John Wiley and#38; Sons, 2011. HRD. Condizione libro: New. New Book. Delivered from our US warehouse in 10 to 14 business days. THIS BOOK IS PRINTED ON DEMAND.Established seller since 2000. Codice libro della libreria IP-9780470625958

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Karen A. Reinhardt; Richard F. Reidy
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Descrizione libro John Wiley and Sons Ltd, United Kingdom, 2011. Hardback. Condizione libro: New. 256 x 178 mm. Language: English . Brand New Book ***** Print on Demand *****. This comprehensive volume provides an in-depth discussion of the fundamentals of cleaning and surface conditioning of semiconductor applications such as high-k/metal gate cleaning, copper/low-k cleaning, high dose implant stripping, and silicon and SiGe passivation. The theory and fundamental physics associated with wet etching and wet cleaning is reviewed, plus the surface and colloidal aspects of wet processing. Formulation development practices and methodology are presented along with the applications for preventing copper corrosion, cleaning aluminum lines, and other sensitive layers. This is a must-have reference for any engineer or manager associated with using or supplying cleaning and contamination free technologies for semiconductor manufacturing. From the Reviews. This handbook will be a valuable resource for many academic libraries. Many engineering librarians who work with a variety of programs (including, but not limited to Materials Engineering) should include this work in their collection. My recommendation is to add this work to any collection that serves a campus with a materials/manufacturing/electrical/computer engineering programs and campuses with departments of physics and/or chemistry with large graduate-level enrollment. Randy Wallace, Department Head, Discovery Park Library, University of North Texas. Codice libro della libreria APC9780470625958

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Karen A. Reinhardt; Richard F. Reidy
Editore: John Wiley and Sons Ltd, United Kingdom (2011)
ISBN 10: 0470625953 ISBN 13: 9780470625958
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Descrizione libro John Wiley and Sons Ltd, United Kingdom, 2011. Hardback. Condizione libro: New. 256 x 178 mm. Language: English . Brand New Book ***** Print on Demand *****.This comprehensive volume provides an in-depth discussion of the fundamentals of cleaning and surface conditioning of semiconductor applications such as high-k/metal gate cleaning, copper/low-k cleaning, high dose implant stripping, and silicon and SiGe passivation. The theory and fundamental physics associated with wet etching and wet cleaning is reviewed, plus the surface and colloidal aspects of wet processing. Formulation development practices and methodology are presented along with the applications for preventing copper corrosion, cleaning aluminum lines, and other sensitive layers. This is a must-have reference for any engineer or manager associated with using or supplying cleaning and contamination free technologies for semiconductor manufacturing. From the Reviews. This handbook will be a valuable resource for many academic libraries. Many engineering librarians who work with a variety of programs (including, but not limited to Materials Engineering) should include this work in their collection. My recommendation is to add this work to any collection that serves a campus with a materials/manufacturing/electrical/computer engineering programs and campuses with departments of physics and/or chemistry with large graduate-level enrollment. Randy Wallace, Department Head, Discovery Park Library, University of North Texas. Codice libro della libreria APC9780470625958

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Descrizione libro Wiley-Scrivener, 2017. Hardcover. Condizione libro: New. This item is printed on demand. Codice libro della libreria 0470625953

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