Soft X-Rays and Extreme Ultraviolet Radiation: Principles and Applications - Rilegato

Attwood, David

Rilegato

ISBN 10: 0521652146 ISBN 13: 9780521652148

Casa editrice: Cambridge University Press, 1999

Riassunto

This detailed, comprehensive book describes the fundamental properties of soft X-rays and extreme ultraviolet (EUV) radiation and discusses their applications in a wide variety of fields, including EUV lithography for semiconductor chip manufacture and soft X-ray biomicroscopy. The author begins by presenting the relevant basic principles such as radiation and scattering, wave propagation, diffraction, and coherence. He then goes on to examine a broad range of phenomena and applications. The topics covered include spectromicroscopy, EUV astronomy, synchrotron radiation, and soft X-ray lasers. The author also provides a wealth of useful reference material such as electron binding energies, characteristic emission lines and photo-absorption cross-sections. The book will be of great interest to graduate students and researchers in engineering, physics, chemistry, and the life sciences. It will also appeal to practising engineers involved in semiconductor fabrication and materials science.

Su questo libro

Recensione:

"The region of the electromagnetic spectrum covered by this excellently written and produced book has only become available to exploitation over the last couple of decades or so...every researcher, teacher and student involved with the generation, manipulation or applications of electromagnetic radiation in this part of the spectrum should make space on their desk (not the bookshelf, since it won't spend much time there!) for this wonderful addition to the literature." Contemporary Physics

Contenuti:

1. Introduction; 2. Radiation and scattering at EUV and soft X-ray wavelengths; 3. Wave propagation and refractive index at EUV and soft X-ray wavelengths; 4. Multilayer interference coatings; 5. Synchrotron radiation; 6. Physics of hot-dense plasmas; 7. Extreme ultraviolet and soft X-ray lasers; 8. Coherence at short wavelengths; 9. X-Ray microscopy with diffractive optics; 10. Extreme ultraviolet and X-ray lithography; Appendices.

Su questa edizione

• Editore: Cambridge University Press
• Data di pubblicazione: 1999
• ISBN 10: 0521652146
• ISBN 13: 9780521652148
• Rilegatura: Copertina rigida
• Numero di pagine: 486