Handbook of Chemical Vapor Deposition: Principles, Technology, and Applications - Rilegato

Pierson, Hugh O.

Rilegato

ISBN 10: 0815514328 ISBN 13: 9780815514329

Casa editrice: Noyes Pubns, 1999

Riassunto

Turn to this new second edition for an understanding of the latest advances in the chemical vapor deposition (CVD) process. CVD technology has recently grown at a rapid rate, and the number and scope of its applications and their impact on the market have increased considerably. The market is now estimated to be at least double that of a mere seven years ago when the first edition of this book was published. The second edition is an update with a considerably expanded and revised scope. Plasma CVD and metallo-organic CVD are two major factors in this rapid growth. Readers will find the latest data on both processes in this volume. Likewise, the book explains the growing importance of CVD in production of semiconductor and related applications.

Su questo libro

Recensione:

".presents an objective and systematic assessment." - High Tech Ceramics News

L'autore:

Hugh Pierson is a private consultant in Chemical Vapor Deposition. He was the head of the Deposition

Su questa edizione

• Editore: Noyes Pubns
• Data di pubblicazione: 1999
• ISBN 10: 0815514328
• ISBN 13: 9780815514329
• Rilegatura: Copertina rigida
• Numero di pagine: 506