Sinossi
Here for the first time is an integrated mathematical view of the physics and numerical modeling of optical projection lithography that efficiently covers the full spectrum of the important concepts. Alfred Wong offers rigorous underpinning, clarity in systematic formulation, physical insight into emerging ideas, as well as a system level view of the parameter tolerances required in manufacturing. Readers with a good working knowledge of calculus can follow the step-by-step development, and technologists can gather general concepts and the key equations that result. Even the casual reader will gain a perspective on the key concepts, which will likely help facilitate dialog among technologists.
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Optical Imaging in Projection Microlithography (SPIE Tutorial Texts in Optical Engineering Vol. TT66)
Da: Kennys Bookshop and Art Galleries Ltd., Galway, GY, Irlanda
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Condizione: New. An integrated mathematical view of the physics and numerical modeling of optical projection lithography that covers the full spectrum of the important concepts. Readers with a good working knowledge of calculus can follow the development, technologists can gather concepts and the equations that result. The casual reader will gain a perspective. Series: Tutorial Texts. Num Pages: 276 pages, Illustrations. BIC Classification: TJFC; TTB. Category: (P) Professional & Vocational; (UP) Postgraduate, Research & Scholarly. Dimension: 253 x 181 x 18. Weight in Grams: 662. . 2005. illustrated edition. Paperback. . . . . Codice articolo V9780819458292
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Optical Imaging in Projection Microlithography
Da: PBShop.store UK, Fairford, GLOS, Regno Unito
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PAP. Condizione: New. New Book. Shipped from UK. Established seller since 2000. Codice articolo FW-9780819458292
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Optical Imaging in Projection Microlithography (SPIE Tutorial Texts in Optical Engineering Vol. TT66)
Da: Revaluation Books, Exeter, Regno Unito
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Paperback. Condizione: Brand New. illustrated edition. 276 pages. 9.75x6.75x0.50 inches. In Stock. Codice articolo __0819458295
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Optical Imaging in Projection Microlithography
Editore:
SPIE - International Society for Optical Engineering, 2005
ISBN 10: 0819458295
ISBN 13: 9780819458292
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Da: Majestic Books, Hounslow, Regno Unito
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Condizione: New. pp. xix + 254 Illus. Codice articolo 6352633
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Optical Imaging in Projection Microlithography
Da: Rarewaves.com USA, London, LONDO, Regno Unito
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Paperback. Condizione: New. illustrated Edition. Here for the first time is an integrated mathematical view of the physics and numerical modeling of optical projection lithography that efficiently covers the full spectrum of the important concepts. Alfred Wong offers rigorous underpinning, clarity in systematic formulation, physical insight into emerging ideas, as well as a system level view of the parameter tolerances required in manufacturing. Readers with a good working knowledge of calculus can follow the step-by-step development, and technologists can gather general concepts and the key equations that result. Even the casual reader will gain a perspective on the key concepts, which will likely help facilitate dialog among technologists. Codice articolo LU-9780819458292
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Optical Imaging in Projection Microlithography (SPIE Tutorial Texts in Optical Engineering Vol. TT66)
Da: Kennys Bookstore, Olney, MD, U.S.A.
Valutazione del venditore 5 su 5 stelle
Condizione: New. An integrated mathematical view of the physics and numerical modeling of optical projection lithography that covers the full spectrum of the important concepts. Readers with a good working knowledge of calculus can follow the development, technologists can gather concepts and the equations that result. The casual reader will gain a perspective. Series: Tutorial Texts. Num Pages: 276 pages, Illustrations. BIC Classification: TJFC; TTB. Category: (P) Professional & Vocational; (UP) Postgraduate, Research & Scholarly. Dimension: 253 x 181 x 18. Weight in Grams: 662. . 2005. illustrated edition. Paperback. . . . . Books ship from the US and Ireland. Codice articolo V9780819458292
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Foto dell'editore
Optical Imaging in Projection Microlithography
Editore:
SPIE - International Society for Optical Engineering, 2005
ISBN 10: 0819458295
ISBN 13: 9780819458292
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Da: Books Puddle, New York, NY, U.S.A.
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Condizione: New. pp. xix + 254. Codice articolo 261528102
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Optical Imaging in Projection Microlithography
Da: THE SAINT BOOKSTORE, Southport, Regno Unito
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Paperback / softback. Condizione: New. New copy - Usually dispatched within 4 working days. Codice articolo B9780819458292
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Optical Imaging in Projection Microlithography
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SPIE Press, 2005
ISBN 10: 0819458295
ISBN 13: 9780819458292
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Einband - flex.(Paperback)
Da: moluna, Greven, Germania
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Einband - flex.(Paperback). Condizione: New. An integrated mathematical view of the physics and numerical modeling of optical projection lithography that covers the full spectrum of the important concepts. Readers with a good working knowledge of calculus can follow the development, technologists can . Codice articolo 2146021731
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Optical Imaging in Projection Microlithography
Da: Rarewaves.com UK, London, Regno Unito
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Paperback. Condizione: New. illustrated Edition. Here for the first time is an integrated mathematical view of the physics and numerical modeling of optical projection lithography that efficiently covers the full spectrum of the important concepts. Alfred Wong offers rigorous underpinning, clarity in systematic formulation, physical insight into emerging ideas, as well as a system level view of the parameter tolerances required in manufacturing. Readers with a good working knowledge of calculus can follow the step-by-step development, and technologists can gather general concepts and the key equations that result. Even the casual reader will gain a perspective on the key concepts, which will likely help facilitate dialog among technologists. Codice articolo LU-9780819458292
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