Rapid Thermal and Integrated Processing IV: Volume 387: Symposium Held April 17-20, 1995, San Francisco, California, U.S.A - Rilegato

Rilegato

ISBN 10: 1558992901 ISBN 13: 9781558992900

Casa editrice: Materials Research Society, 1995

Riassunto

The fourth in a continuing series on rapid thermal processing (RTP), this volume addresses work in traditional RTP processes such as dielectric growth, annealing and silicides, as well as developments in integrated processes. The primary focus, however, is the manufacturing aspects of RTP and the successful integration of RTP into production semiconductor fabs. Emphasis is placed on process and equipment modelling and the critical aspects of RTP, such as temperature measurement, uniformity and control. Topics include: modelling, sensors and control; integrated processing and manufacturing; dielectrics; epitaxy, polysilicon and devices; and junctions, metallization and contacts.

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Su questa edizione

• Editore: Materials Research Society
• Data di pubblicazione: 1995
• ISBN 10: 1558992901
• ISBN 13: 9781558992900
• Rilegatura: Copertina rigida
• Numero di pagine: 455
• Redattore: Brueck Steven R. J., Gelpey Jeffrey C., Kermani Ahman, Regolini Jorgé L., Sturm James C.