Chemical-Mechanical Polishing 2000 – Fundamentals and Materials Issues: Volume 613 - Rilegato

Rilegato

ISBN 10: 1558995218 ISBN 13: 9781558995215

Casa editrice: Cambridge University Press, 2001

Riassunto

Chemical-mechanical polishing (CMP) is a critical technology in the planarization of multilevel metallization systems and shallow-trench isolation in semiconductor manufacturing. Other emerging applications for this technology include flat-panel displays, magnetic data storage and microelectromechanical systems. The rapid emergence of copper as the conducting material for integrated circuits has further pushed CMP technology to the forefront of semiconductor manufacturing. However, a basic understanding of the CMP process, which is necessary to enable further advances, is inadequate. This book, first published in 2001, provides an insight into the fundamental processes in CMP. Presentations from academia, government institutions and industry are featured. Topics include: CMP mechanisms; dielectric and metal CMP; process integration and manufacturability; and CMP consumables.

Su questo libro

Descrizione del libro:

Chemical-mechanical polishing (CMP) is a critical technology in the planarization of multilevel metallization systems and shallow-trench isolation in semiconductor manufacturing. This book, first published in 2001, provides an insight into the fundamental processes in CMP. Presentations from academia, government institutions and industry are featured.

Su questa edizione

• Editore: Cambridge University Press
• Data di pubblicazione: 2001
• ISBN 10: 1558995218
• ISBN 13: 9781558995215
• Rilegatura: Copertina rigida
• Numero di pagine: 178
• Redattore: Singh Rajiv K., Bajaj Rajeev, Moinpour Mansour, Meuris Marc