Articoli correlati a Ultraclean Surface Processing of Silicon Wafers: Secrets...

Ultraclean Surface Processing of Silicon Wafers: Secrets of Vlsi Manufacturing - Rilegato

 
9783540616726: Ultraclean Surface Processing of Silicon Wafers: Secrets of Vlsi Manufacturing

Sinossi

A totally new concept for clean surface processing of Si wafers is introduced in this book. Some fifty distinguished researchers and engineers from the leading Japanese semiconductor companies, such as NEC, Hitachi, Toshiba, Sony and Panasonic as well as from several universities reveal to us for the first time the secrets of these highly productive institutions. They describe the techniques and equipment necessary for the preparation of clean high-quality semiconductor surfaces as a first step in high-yield/high-quality device production. This book thus opens the door to the manufacturing of reliable nanoscale devices and will be extremely useful for every engineer, physicist and technician involved in the production of silicon semiconductor devices.

Le informazioni nella sezione "Riassunto" possono far riferimento a edizioni diverse di questo titolo.

Dalla quarta di copertina

The contamination of wafer surfaces with particles arising from the processing equipment is the main reason for yield losses in the manufacturing of VLSI devices. The starting point for the control of contamination must be the surface of the wafer itself and not just the reduction of contamination in the ambient air or in the gases, chemicals and water used for production. A totally new concept for clean surface processing is introduced here. Some fifty distinguished researchers and engineers from the leading Japanese semiconductor companies, such as NEC, Hitachi, Toshiba, Sony and Panasonic, as well as from several universities reveal to us for the first time the secrets of these highly productive institutions. They describe the techniques and equipment necessary for the preparation of clean high-quality semiconductor surfaces as a first step in high-yield/high-quality device production. This book thus opens the door to the manufacturing of reliable nanoscale devices and will be extremely useful for every engineer, physicist and technician involved in the production of silicon semiconductor devices.

Le informazioni nella sezione "Su questo libro" possono far riferimento a edizioni diverse di questo titolo.

Compra usato

Condizioni: buono
Connecting readers with great books...
Visualizza questo articolo

EUR 92,72 per la spedizione da U.S.A. a Italia

Destinazione, tempi e costi

EUR 10,38 per la spedizione da Regno Unito a Italia

Destinazione, tempi e costi

Altre edizioni note dello stesso titolo

9783642082726: Ultraclean Surface Processing of Silicon Wafers: Secrets of VLSI Manufacturing

Edizione in evidenza

ISBN 10:  3642082726 ISBN 13:  9783642082726
Casa editrice: Springer, 2010
Brossura

Risultati della ricerca per Ultraclean Surface Processing of Silicon Wafers: Secrets...

Foto dell'editore

Hattori, Takeshi
Editore: Springer, 1998
ISBN 10: 3540616721 ISBN 13: 9783540616726
Antico o usato Rilegato

Da: HPB-Red, Dallas, TX, U.S.A.

Valutazione del venditore 5 su 5 stelle 5 stelle, Maggiori informazioni sulle valutazioni dei venditori

Hardcover. Condizione: Good. Connecting readers with great books since 1972! Used textbooks may not include companion materials such as access codes, etc. May have some wear or writing/highlighting. We ship orders daily and Customer Service is our top priority! Codice articolo S_354549792

Contatta il venditore

Compra usato

EUR 83,92
Convertire valuta
Spese di spedizione: EUR 92,72
Da: U.S.A. a: Italia
Destinazione, tempi e costi

Quantità: 1 disponibili

Aggiungi al carrello

Foto dell'editore

Hattori, Takeshi
Editore: Springer, 1998
ISBN 10: 3540616721 ISBN 13: 9783540616726
Nuovo Rilegato

Da: Ria Christie Collections, Uxbridge, Regno Unito

Valutazione del venditore 5 su 5 stelle 5 stelle, Maggiori informazioni sulle valutazioni dei venditori

Condizione: New. In. Codice articolo ria9783540616726_new

Contatta il venditore

Compra nuovo

EUR 313,87
Convertire valuta
Spese di spedizione: EUR 10,38
Da: Regno Unito a: Italia
Destinazione, tempi e costi

Quantità: Più di 20 disponibili

Aggiungi al carrello

Immagini fornite dal venditore

Takeshi Hattori
ISBN 10: 3540616721 ISBN 13: 9783540616726
Nuovo Rilegato
Print on Demand

Da: BuchWeltWeit Ludwig Meier e.K., Bergisch Gladbach, Germania

Valutazione del venditore 5 su 5 stelle 5 stelle, Maggiori informazioni sulle valutazioni dei venditori

Buch. Condizione: Neu. This item is printed on demand - it takes 3-4 days longer - Neuware -A totally new concept for clean surface processing of Si wafers is introduced in this book. Some fifty distinguished researchers and engineers from the leading Japanese semiconductor companies, such as NEC, Hitachi, Toshiba, Sony and Panasonic as well as from several universities reveal to us for the first time the secrets of these highly productive institutions. They describe the techniques and equipment necessary for the preparation of clean high-quality semiconductor surfaces as a first step in high-yield/high-quality device production. This book thus opens the door to the manufacturing of reliable nanoscale devices and will be extremely useful for every engineer, physicist and technician involved inthe production of silicon semiconductor devices. 616 pp. Englisch. Codice articolo 9783540616726

Contatta il venditore

Compra nuovo

EUR 320,99
Convertire valuta
Spese di spedizione: EUR 11,00
Da: Germania a: Italia
Destinazione, tempi e costi

Quantità: 2 disponibili

Aggiungi al carrello

Immagini fornite dal venditore

Takeshi Hattori
ISBN 10: 3540616721 ISBN 13: 9783540616726
Nuovo Rilegato

Da: AHA-BUCH GmbH, Einbeck, Germania

Valutazione del venditore 5 su 5 stelle 5 stelle, Maggiori informazioni sulle valutazioni dei venditori

Buch. Condizione: Neu. Druck auf Anfrage Neuware - Printed after ordering - A totally new concept for clean surface processing of Si wafers is introduced in this book. Some fifty distinguished researchers and engineers from the leading Japanese semiconductor companies, such as NEC, Hitachi, Toshiba, Sony and Panasonic as well as from several universities reveal to us for the first time the secrets of these highly productive institutions. They describe the techniques and equipment necessary for the preparation of clean high-quality semiconductor surfaces as a first step in high-yield/high-quality device production. This book thus opens the door to the manufacturing of reliable nanoscale devices and will be extremely useful for every engineer, physicist and technician involved inthe production of silicon semiconductor devices. Codice articolo 9783540616726

Contatta il venditore

Compra nuovo

EUR 324,84
Convertire valuta
Spese di spedizione: EUR 14,99
Da: Germania a: Italia
Destinazione, tempi e costi

Quantità: 2 disponibili

Aggiungi al carrello

Immagini fornite dal venditore

Hattori, Takeshi
ISBN 10: 3540616721 ISBN 13: 9783540616726
Nuovo Rilegato

Da: moluna, Greven, Germania

Valutazione del venditore 5 su 5 stelle 5 stelle, Maggiori informazioni sulle valutazioni dei venditori

Gebunden. Condizione: New. Handbook on most advanced technologies in surface processing of silicon wafers.A totally new concept for clean surface processing of Si wafers is introduced in this book. Some fifty distinguished researchers and engineers from the leading Japanese semic. Codice articolo 4895705

Contatta il venditore

Compra nuovo

EUR 336,82
Convertire valuta
Spese di spedizione: EUR 9,70
Da: Germania a: Italia
Destinazione, tempi e costi

Quantità: Più di 20 disponibili

Aggiungi al carrello