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9789024730933: Surface Engineering: Surface Modification of Materials: 85

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Over the last few years there has been increasing need for systematic and straregically designed experiments of surface morphology evolution resulting form ion bombardment induced sputtering. Although there is an impressive number of investi­ gations {1} concerned with semiconductor materials as a result of immediate applications, the most systematic investigations have been conducted with fcc metals with particular interest on single crystal Cu {2,3}. Evidence now exists that within certain para­ meters (i. e ion species (Ar+), ion energy (20-44 KeV), substrate 2 temperature (80-550° K), dose rate (100-500 gA cm- ) , residual x 5 9 pressure (5 10- to 5x10- mm Hg) and polar and azimuthal angle of ion incidence {4} reproducible surface morphology (etch pits and pyramids) is achieved on the (11 3 1) specific crystallographic orientation. The temporal development of individual surface features was alsoobserved in this laterstudy {4}, by employing an in situ ion source in the scanning electron microscope at Salford, a technique also empolyed in studies of the influence of polar angle of ion incidence {5} and surface contaminants {6} on the topographyof Ar+ bombarded Si. Studies have also been made on the variation of incident ion species with the (11 3 1) Cu surface and it was fully recognized {7} that residual surface contaminants when present could playa major role in dictating the morhological evolution.

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I: Ion Implantation.- 1. Physics of Ion Implantation.- 2. Recoil Implantation and Ion Mixing.- 3. On the Use of Reactive Ion-Beam Mixing for Surface Modifications.- 4. Surface Topographical Changes on (11 3 1) Copper Surfaces Bombarded with 40 keV N+, Ne+, Ar+, Cu+, Kr and Xe+ Ions.- 5. Lattice Location Studies on Hafnium, Thallium and Lead Implanted Magnesium Single Crystals.- 6. Ion Mixing in the Ag-Ni and Fe-Sn Systems.- 7. Ion Implantation and Optical Properties.- 8. Optical Waveguide Formation in Quartz by Ion Implantation.- 9. Optical Properties of Ion Implanted Indium Tin Oxide Glasses.- 10. Ion Implantation and Related Treatments Applied in Tribology.- 11. Nitrogen Implantation into Steels: Influence of Fluence and Temperature after Implantation.- 12. Parameter Induced Changes in the Wear Behavior of Ion Implanted Steel under Heavy Loading.- 13. Hardness and Wear Correlations in Nitrogen-Implanted Metals.- 14. Wear Resistant Performance of Ion Implanted Alloy Steels.- 15. Effects of Ion Implantation on the Tribological Behavior of a Cobalt Based Alloy.- 16. The Effect of Ion Implantation on Adhesive Bonding to and Wear of, Copper and Copper-Base Alloys.- 17. Structure Property Relationships in Ion Implanted Ceramics.- 18. A Prototype Ion Implanter for Industrial Tool and Die Processing.- 19. High Dose Rate Ion Implantation Processes and System Characterizations (Semiconductor Technology Applications).- 20. The Implications of Surface Technology in the Sawing of Wood.- 2: Laser Surface Modification.- 1. Understanding the Technology and Industrial Acceptance of Laser Surface Modifications.- 2. Laser Processing of Metals and Coatings for Enhanced Surface Properties.- 3. Surface Processing by a Pulsed Laser.- 4. Mixing of Pb and Ni under Ion Bombardment and Pulsed Laser Irradiation.- 3: High Temperature Protective Coatings.- 1. Thermodynamics and Kinetics of Pack Cementation Processes.- 2. Basic Oxidation Principles: Growth of Continuous Scales.- 3. Protective Coatings for Materials in High Temperature Technology -European R, D Needs-.- 4. Protective Coatings for High Temperature Gas turbine Alloys A Review of the State of Technology.- 5. Microstructure, Properties and Mechanism of Formation of Aluminum Diffusion Coatings on Heat-Resistant Stainless Steels.- 6. Aluminide Coatings on Superalloys.- 7. Structure of Platinum Modified Aluminide Coatings.- 8. A Microstructural Study of MCrALY Coatings.- 9. Oxidation Behavior of a NiCrAl Alloy Recoil-Implanted with Yttrium.- 10. Modification of the Oxidation and Hot Corrosion Behavior of CoCrA1s Alloys by Ion Implantation.- 11. Insulative, Wear and Corrosion Resistant Coatings for Diesel and Gas Turbine Engines.- 12. Studies on Plasma-Sprayed Thermal Barrier Coatings.- Design of Coatings for High Temperature Corrosion Protection.- 4: Miscellaneous Surface Modification Processes and Properties.- 1. Ion Beam Effects in Surface Modification Techniques.- 2. Ion Plating and the Production of Cu-Cr Alloy Coatings.- 3. Electrolytic Composite Coatings for Increased Wear Resistance of Metals.- 4. Surface Treatment for Corrosion Protection.- 5. Surface Modified Electrodes — Reasons and Advantages.- 6. Surface Damage in Manganese Zinc and Nickel Zinc Ferrites.- 7. The Effect of Surface Modifications Upon the Mechanical Performance of Metals and Alloys.- 8. Silicon Segregation in Sliding Wear: An Esca-Aes Investigation.- 9. Diffusion Induced Grain Boundary Migration in Surface Modification Processes.- 10. Laser Probe Microanalysis of Near-Surface Layers by Time-Of-Flight Mass Spectrometry.- 11. Surface Analysis of Physical Vapor Deposited Semiconducting Oxides.

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9789400962187: Surface Engineering: Surface Modification of Materials: 85

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ISBN 10:  9400962185 ISBN 13:  9789400962187
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Kossowsky, Ram, & Subhash C. Singhal, eds.
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Buch. Condizione: Neu. This item is printed on demand - it takes 3-4 days longer - Neuware -Over the last few years there has been increasing need for systematic and straregically designed experiments of surface morphology evolution resulting form ion bombardment induced sputtering. Although there is an impressive number of investi gations {1} concerned with semiconductor materials as a result of immediate applications, the most systematic investigations have been conducted with fcc metals with particular interest on single crystal Cu {2,3}. Evidence now exists that within certain para meters (i. e ion species (Ar+), ion energy (20-44 KeV), substrate 2 temperature (80-550° K), dose rate (100-500 gA cm- ) , residual x 5 9 pressure (5 10- to 5x10- mm Hg) and polar and azimuthal angle of ion incidence {4} reproducible surface morphology (etch pits and pyramids) is achieved on the (11 3 1) specific crystallographic orientation. The temporal development of individual surface features was alsoobserved in this laterstudy {4}, by employing an in situ ion source in the scanning electron microscope at Salford, a technique also empolyed in studies of the influence of polar angle of ion incidence {5} and surface contaminants {6} on the topographyof Ar+ bombarded Si. Studies have also been made on the variation of incident ion species with the (11 3 1) Cu surface and it was fully recognized {7} that residual surface contaminants when present could playa major role in dictating the morhological evolution. 780 pp. Englisch. Codice articolo 9789024730933

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Buch. Condizione: Neu. Neuware -Over the last few years there has been increasing need for systematic and straregically designed experiments of surface morphology evolution resulting form ion bombardment induced sputtering. Although there is an impressive number of investi gations {1} concerned with semiconductor materials as a result of immediate applications, the most systematic investigations have been conducted with fcc metals with particular interest on single crystal Cu {2,3}. Evidence now exists that within certain para meters (i. e ion species (Ar+), ion energy (20-44 KeV), substrate 2 temperature (80-550° K), dose rate (100-500 gA cm- ) , residual x 5 9 pressure (5 10- to 5x10- mm Hg) and polar and azimuthal angle of ion incidence {4} reproducible surface morphology (etch pits and pyramids) is achieved on the (11 3 1) specific crystallographic orientation. The temporal development of individual surface features was alsoobserved in this laterstudy {4}, by employing an in situ ion source in the scanning electron microscope at Salford, a technique also empolyed in studies of the influence of polar angle of ion incidence {5} and surface contaminants {6} on the topographyof Ar+ bombarded Si. Studies have also been made on the variation of incident ion species with the (11 3 1) Cu surface and it was fully recognized {7} that residual surface contaminants when present could playa major role in dictating the morhological evolution.Springer Verlag GmbH, Tiergartenstr. 17, 69121 Heidelberg 780 pp. Englisch. Codice articolo 9789024730933

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Gebunden. Condizione: New. Proceedings of the NATO Advanced Study Institute on Surface Engineering, Les Arcs, France, July 3-15, 1983 Over the last few years there has been increasing need for systematic and straregically designed experiments of surface morphology evolution resu. Codice articolo 5813551

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Buch. Condizione: Neu. Druck auf Anfrage Neuware - Printed after ordering - Over the last few years there has been increasing need for systematic and straregically designed experiments of surface morphology evolution resulting form ion bombardment induced sputtering. Although there is an impressive number of investi gations {1} concerned with semiconductor materials as a result of immediate applications, the most systematic investigations have been conducted with fcc metals with particular interest on single crystal Cu {2,3}. Evidence now exists that within certain para meters (i. e ion species (Ar+), ion energy (20-44 KeV), substrate 2 temperature (80-550° K), dose rate (100-500 gA cm- ) , residual x 5 9 pressure (5 10- to 5x10- mm Hg) and polar and azimuthal angle of ion incidence {4} reproducible surface morphology (etch pits and pyramids) is achieved on the (11 3 1) specific crystallographic orientation. The temporal development of individual surface features was alsoobserved in this laterstudy {4}, by employing an in situ ion source in the scanning electron microscope at Salford, a technique also empolyed in studies of the influence of polar angle of ion incidence {5} and surface contaminants {6} on the topographyof Ar+ bombarded Si. Studies have also been made on the variation of incident ion species with the (11 3 1) Cu surface and it was fully recognized {7} that residual surface contaminants when present could playa major role in dictating the morhological evolution. Codice articolo 9789024730933

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