hardcover. Condizione: Good. Connecting readers with great books since 1972! Used textbooks may not include companion materials such as access codes, etc. May have some wear or writing/highlighting. We ship orders daily and Customer Service is our top priority!
Hardcover. Condizione: Good. Connecting readers with great books since 1972! Used textbooks may not include companion materials such as access codes, etc. May have some wear or writing/highlighting. We ship orders daily and Customer Service is our top priority!
Lingua: Inglese
Editore: Van Nostrand Reinhold, (1983)., New York, NY, U.S.A., 1983
ISBN 10: 0442225385 ISBN 13: 9780442225384
Da: Pride and Prejudice-Books, Ballston Lake, NY, U.S.A.
Hardcover. Condizione: Near Fine. Condizione sovraccoperta: Near Fine. First Edition. Near Fine in Near Fine Dust Jacket.
Lingua: Inglese
Editore: Van Nostrand Reinhold Company, 1997
ISBN 10: 0442225385 ISBN 13: 9780442225384
Da: Brentwood Books, Kinnelon, NJ, U.S.A.
hardcover. Condizione: Used, very good. Book and jacket just about like new. This is a brown book in blue jacket, 1997, Van Nostrand, 559p. Book as new except upper page edges very light soiled due to being dusty for a long time; jacket has slightest edgewear. No marks or writing. **We provide professional service and individual attention to your order, daily shipments, and sturdy packaging. FREE TRACKING ON ALL SHIPMENTS WITHIN USA.
Hardcover. Condizione: LIKE NEW. Condizione sovraccoperta: NONE. excellent clean copy.
Hardcover. Condizione: As New. Hardcover. Near fine / near fine dust jacket. Free of any markings and no writings inside. For any additional information or pictures, please inquire.
EUR 24,99
Quantità: 1 disponibili
Aggiungi al carrelloHardcover. Condizione: Très bon. Ancien livre de bibliothèque. Livre un peu vrillé. Légères traces d'usure sur la couverture. Salissures sur la tranche. Edition 1983. Ammareal reverse jusqu'à 15% du prix net de cet article à des organisations caritatives. ENGLISH DESCRIPTION Book Condition: Used, Very good. Former library book. Book slightly twisted. Slight signs of wear on the cover. Stains on the edge. Edition 1983. Ammareal gives back up to 15% of this item's net price to charity organizations.
Da: Ria Christie Collections, Uxbridge, Regno Unito
EUR 111,35
Quantità: Più di 20 disponibili
Aggiungi al carrelloCondizione: New. In.
Da: California Books, Miami, FL, U.S.A.
EUR 125,99
Quantità: Più di 20 disponibili
Aggiungi al carrelloCondizione: New.
Da: Chiron Media, Wallingford, Regno Unito
EUR 112,46
Quantità: 10 disponibili
Aggiungi al carrelloPaperback. Condizione: New.
Lingua: Inglese
Editore: Secaucus, New Jersey, U.S.A.: Kluwer Academic Pub, 1988
ISBN 10: 0442276885 ISBN 13: 9780442276881
Da: Rob the Book Man, Vancouver, WA, U.S.A.
Hardcover. Condizione: Fine. Condizione sovraccoperta: Fine. Hardback in near fine condition with near fine dust jacket. Previous owner stamp on inside of front cover, otherwise clean.
Da: Books Puddle, New York, NY, U.S.A.
Condizione: New. pp. 962.
Condizione: New.
Condizione: New.
Da: Mispah books, Redhill, SURRE, Regno Unito
EUR 132,25
Quantità: 1 disponibili
Aggiungi al carrelloHardcover. Condizione: Like New. LIKE NEW. SHIPS FROM MULTIPLE LOCATIONS. book.
Da: Ria Christie Collections, Uxbridge, Regno Unito
EUR 158,59
Quantità: Più di 20 disponibili
Aggiungi al carrelloCondizione: New. In.
Da: Ria Christie Collections, Uxbridge, Regno Unito
EUR 160,36
Quantità: Più di 20 disponibili
Aggiungi al carrelloCondizione: New. In.
Da: California Books, Miami, FL, U.S.A.
EUR 174,98
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Aggiungi al carrelloCondizione: New.
Da: Revaluation Books, Exeter, Regno Unito
EUR 160,42
Quantità: 2 disponibili
Aggiungi al carrelloPaperback. Condizione: Brand New. reprint edition. 962 pages. 9.25x6.10x2.10 inches. In Stock.
Da: AHA-BUCH GmbH, Einbeck, Germania
EUR 116,27
Quantità: 1 disponibili
Aggiungi al carrelloTaschenbuch. Condizione: Neu. Druck auf Anfrage Neuware - Printed after ordering - Chapter I describes deposition as a basic microelectronics technique. Plasma enhanced chemical vapor deposition (PECVD) is a technique widely accepted in microelectronics for the deposition of amorphous dielectric films such as silicon nitride and silicon oxide. The main advantage of PECVD stems from the intro duction of plasma energy to the CVD environment, which makes it possible to promote chemical reactions at relatively low temperatures. A natural extension of this is to use this plasma energy to lower the temperature required to obtain a crystalline deposit. This chapter discusses the PECVD technique and its ap plication to the deposition of dielectric, semiconductor, and conductor films of interest to microelectronics. Chapter 2 acquaints the reader with the technology and capabilities of plasma processing. Batch etching reactors and etching processes are approaching ma turity after more than ten years of development. Requirements of anisotropic and selective etching have been met using a variety of reactor configurations and etching gases. The present emphasis is the integration of plasma etching processes into the overall fabrication sequence. Chapter 3 reviews recent advances in high pressure oxidation technology and its applications to integrated circuits. The high pressure oxidation system, oxi dation mechanisms, oxidation-induced stacking faults, impurity segregation, and oxide quality are described. Applications to bipolar and MOS devices are also presented.
Da: GreatBookPricesUK, Woodford Green, Regno Unito
EUR 170,42
Quantità: Più di 20 disponibili
Aggiungi al carrelloCondizione: New.
Da: Mispah books, Redhill, SURRE, Regno Unito
EUR 162,95
Quantità: 1 disponibili
Aggiungi al carrelloPaperback. Condizione: Like New. Like New. book.
EUR 178,14
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Aggiungi al carrelloGebunden. Condizione: New. A growing concern of mine has been the unrealistic expectations for new computer-related technologies introduced into all kinds of organizations. Unrealistic expectations lead to disappointment, and a schizophrenic approach to the introduction of new techno.
Da: Mispah books, Redhill, SURRE, Regno Unito
EUR 225,54
Quantità: 1 disponibili
Aggiungi al carrelloHardcover. Condizione: Like New. Like New. book.
Da: Mispah books, Redhill, SURRE, Regno Unito
EUR 232,62
Quantità: 1 disponibili
Aggiungi al carrelloPaperback. Condizione: Like New. Like New. book.
Da: GreatBookPricesUK, Woodford Green, Regno Unito
EUR 242,06
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Aggiungi al carrelloCondizione: As New. Unread book in perfect condition.
Condizione: As New. Unread book in perfect condition.
Lingua: Inglese
Editore: Springer Netherlands Jun 2012, 2012
ISBN 10: 9401170584 ISBN 13: 9789401170581
Da: BuchWeltWeit Ludwig Meier e.K., Bergisch Gladbach, Germania
EUR 85,55
Quantità: 2 disponibili
Aggiungi al carrelloTaschenbuch. Condizione: Neu. This item is printed on demand - it takes 3-4 days longer - Neuware -Chapter I describes deposition as a basic microelectronics technique. Plasma enhanced chemical vapor deposition (PECVD) is a technique widely accepted in microelectronics for the deposition of amorphous dielectric films such as silicon nitride and silicon oxide. The main advantage of PECVD stems from the intro duction of plasma energy to the CVD environment, which makes it possible to promote chemical reactions at relatively low temperatures. A natural extension of this is to use this plasma energy to lower the temperature required to obtain a crystalline deposit. This chapter discusses the PECVD technique and its ap plication to the deposition of dielectric, semiconductor, and conductor films of interest to microelectronics. Chapter 2 acquaints the reader with the technology and capabilities of plasma processing. Batch etching reactors and etching processes are approaching ma turity after more than ten years of development. Requirements of anisotropic and selective etching have been met using a variety of reactor configurations and etching gases. The present emphasis is the integration of plasma etching processes into the overall fabrication sequence. Chapter 3 reviews recent advances in high pressure oxidation technology and its applications to integrated circuits. The high pressure oxidation system, oxi dation mechanisms, oxidation-induced stacking faults, impurity segregation, and oxide quality are described. Applications to bipolar and MOS devices are also presented. 960 pp. Englisch.
Da: moluna, Greven, Germania
EUR 92,27
Quantità: Più di 20 disponibili
Aggiungi al carrelloCondizione: New. Dieser Artikel ist ein Print on Demand Artikel und wird nach Ihrer Bestellung fuer Sie gedruckt. Chapter I describes deposition as a basic microelectronics technique. Plasma enhanced chemical vapor deposition (PECVD) is a technique widely accepted in microelectronics for the deposition of amorphous dielectric films such as silicon nitride and silicon o.
Da: Majestic Books, Hounslow, Regno Unito
EUR 153,02
Quantità: 4 disponibili
Aggiungi al carrelloCondizione: New. Print on Demand pp. 962 49:B&W 6.14 x 9.21 in or 234 x 156 mm (Royal 8vo) Perfect Bound on White w/Gloss Lam.