9783540766629 - reactive sputter deposition: 109 (8 risultati)

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Da: Ria Christie Collections, Uxbridge, Regno UnitoRia Christie Collections
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Condizione: New. In.

Lingua: Inglese
Editore: Springer Berlin Heidelberg, Springer Berlin Heidelberg 2008
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Da: AHA-BUCH GmbH, Einbeck, GermaniaAHA-BUCH GmbH
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EUR 353,09
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Buch. Condizione: Neu. Druck auf Anfrage Neuware - Printed after ordering - The most straightforwardmethod to change the surface properties of a ma- rial is to deposit a thin lm or coating on it. Hence, it is not surprising that an overwhelming amount of scienti c and technical papers is published each year on this topic. Sputte…r deposition is one of the many so-called physical vapour deposition (PVD) techniques. In most cases, sputter deposition uses a magnetically enhanced glow discharge or magnetron discharge to produce the ions which bombard and sputter the cathode material. In the rst chapter of this book (Chap. 1), the details of the sputter process are discussed. Essential to sustain the discharge is the electron emission during ion bombardment. Indeed, the emitted electrons are accelerated from the target and can ionize gas atoms. The formed ions bombard again the target completing the s- taining process. A complete chapter is assigned to this process to highlight its importance (Chap. 2). Although the sustaining process can be described quite straightforward, a complete understanding of the magnetron discharge and the in uence of di erent parameters on the discharge characteristics is onlypossiblebymodelling(seeChap.3).Withthesethreechapters,thereader should be able to form an idea of the target and plasma processes occurring during a DC magnetron discharge.

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Da: Revaluation Books, Exeter, Regno UnitoRevaluation Books
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EUR 498,43
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Hardcover. Condizione: Brand New. 1st edition. 572 pages. 9.25x6.25x1.50 inches. In Stock.

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Da: Brook Bookstore On Demand, Napoli, ItaliaBrook Bookstore On Demand
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Condizione: new. Questo è un articolo print on demand.

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Da: moluna, Greven, Germaniamoluna
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EUR 294,19
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Condizione: New. Dieser Artikel ist ein Print on Demand Artikel und wird nach Ihrer Bestellung fuer Sie gedruckt. Covers all the sputtering techniques for thin-film depositionDescribes the physical basics and related technical realizationGives advice on controlling the sputter process and quality of the layers producedValuable r…eference work for.

Lingua: Inglese
Editore: Springer Berlin Heidelberg, Springer Berlin Heidelberg Apr 2008 2008
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Da: BuchWeltWeit Ludwig Meier e.K., Bergisch Gladbach, GermaniaBuchWeltWeit Ludwig Meier e.K.
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EUR 353,09
EUR 23,00 spedizioneSpedito da Germania a U.S.A.Quantità: 2 disponibili
Buch. Condizione: Neu. This item is printed on demand - it takes 3-4 days longer - Neuware -The most straightforwardmethod to change the surface properties of a ma- rial is to deposit a thin lm or coating on it. Hence, it is not surprising that an overwhelming amount of scienti c and technical papers is published each year on th…is topic. Sputter deposition is one of the many so-called physical vapour deposition (PVD) techniques. In most cases, sputter deposition uses a magnetically enhanced glow discharge or magnetron discharge to produce the ions which bombard and sputter the cathode material. In the rst chapter of this book (Chap. 1), the details of the sputter process are discussed. Essential to sustain the discharge is the electron emission during ion bombardment. Indeed, the emitted electrons are accelerated from the target and can ionize gas atoms. The formed ions bombard again the target completing the s- taining process. A complete chapter is assigned to this process to highlight its importance (Chap. 2). Although the sustaining process can be described quite straightforward, a complete understanding of the magnetron discharge and the in uence of di erent parameters on the discharge characteristics is onlypossiblebymodelling(seeChap.3).Withthesethreechapters,thereader should be able to form an idea of the target and plasma processes occurring during a DC magnetron discharge. 592 pp. Englisch.

Lingua: Inglese
Editore: Springer Berlin Heidelberg, Springer Berlin Heidelberg Apr 2008 2008
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Da: buchversandmimpf2000, Emtmannsberg, Germaniabuchversandmimpf2000
Contatta il venditoreVenditore con 5 stelleCondizione: Nuovo
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EUR 60,00 spedizioneSpedito da Germania a U.S.A.Quantità: 1 disponibili
Buch. Condizione: Neu. This item is printed on demand - Print on Demand Titel. Neuware -The most straightforwardmethod to change the surface properties of a ma- rial is to deposit a thin lm or coating on it. Hence, it is not surprising that an overwhelming amount of scienti c and technical papers is published each year on this t…opic. Sputter deposition is one of the many so-called physical vapour deposition (PVD) techniques. In most cases, sputter deposition uses a magnetically enhanced glow discharge or magnetron discharge to produce the ions which bombard and sputter the cathode material. In the rst chapter of this book (Chap. 1), the details of the sputter process are discussed. Essential to sustain the discharge is the electron emission during ion bombardment. Indeed, the emitted electrons are accelerated from the target and can ionize gas atoms. The formed ions bombard again the target completing the s- taining process. A complete chapter is assigned to this process to highlight its importance (Chap. 2). Although the sustaining process can be described quite straightforward, a complete understanding of the magnetron discharge and the in uence of di erent parameters on the discharge characteristics is onlypossiblebymodelling(seeChap.3).Withthesethreechapters,thereader should be able to form an idea of the target and plasma processes occurring during a DC magnetron discharge.Springer-Verlag GmbH, Tiergartenstr. 17, 69121 Heidelberg 592 pp. Englisch.

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Da: Books Puddle, New York, U.S.A.Books Puddle
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Condizione: New. Print on Demand pp. 592.