Directed Self-assembly of Block Co-polymers for Nano-manufacturing - Rilegato

Rilegato

ISBN 10: 0081002505 ISBN 13: 9780081002506

Casa editrice: Woodhead Pub Ltd, 2015

Riassunto

The directed self-assembly (DSA) method of patterning for microelectronics uses polymer phase-separation to generate features of less than 20nm, with the positions of self-assembling materials externally guided into the desired pattern. Directed self-assembly of Block Co-polymers for Nano-manufacturing reviews the design, production, applications and future developments needed to facilitate the widescale adoption of this promising technology.

Beginning with a solid overview of the physics and chemistry of block copolymer (BCP) materials, Part 1 covers the synthesis of new materials and new processing methods for DSA. Part 2 then goes on to outline the key modelling and characterization principles of DSA, reviewing templates and patterning using topographical and chemically modified surfaces, line edge roughness and dimensional control, x-ray scattering for characterization, and nanoscale driven assembly. Finally, Part 3 discusses application areas and related issues for DSA in nano-manufacturing, including for basic logic circuit design, the inverse DSA problem, design decomposition and the modelling and analysis of large scale, template self-assembly manufacturing techniques.

• Authoritative outlining of theoretical principles and modeling techniques to give a thorough introdution to the topic
• Discusses a broad range of practical applications for directed self-assembly in nano-manufacturing
• Highlights the importance of this technology to both the present and future of nano-manufacturing by exploring its potential use in a range of fields

Su questo libro

Dalla quarta di copertina

The directed self-assembly (DSA) method of patterning for microelectronics uses polymer phase-separation to generate features of less than 20nm, with the positions of self-assembling materials externally guided into the desired pattern. Directed self-assembly of semiconductor nanostructures reviews the design, production, applications and future developments needed to facilitate the widescale adoption of this promising technology.

Beginning with a solid overview of the physics and chemistry of block copolymer (BCP) materials, Part 1 covers the synthesis of new materials and new processing methods for DSA. Part 2 then goes on to outline the key modelling and characterization principles of DSA, reviewing templates and patterning using topographical and chemically modified surfaces, line edge roughness and dimensional control, x-ray scattering for characterization, and nanoscale driven assembly. Finally, Part 3 discusses application areas and related issues for DSA in nano-manufacturing, including for basic logic circuit design, the inverse DSA problem, design decomposition and the modelling and analysis of large scale, template self-assembly manufacturing techniques.

Dettagli dell?edizione

• Editore: Woodhead Pub Ltd
• Data di pubblicazione: 2015
• Lingua: Inglese
• ISBN 10: 0081002505
• ISBN 13: 9780081002506
• Rilegatura: Copertina rigida
• Numero edizione: 1
• Numero di pagine: 328
• Redattore: Gronheid Roel, Nealey Paul
• Contatto del produttore: non disponibile
• Persona responsabile: non disponibile