Modern Ion Plating Technology: Fundamentals and Applications - Brossura

Wang; Wu

Brossura

ISBN 10: 0323908330 ISBN 13: 9780323908337

Casa editrice: Elsevier, 2022

Riassunto

Modern Ion Plating Technology: Fundamentals and Applications discusses the fundamental concepts of plasma physics in various coating technologies and explores its development and implementation into new technologies. Recent progress of technologies and products via ion plating will be introduced. The book begins with the treatment of vacuum physics, through plasma physics. It then presents the various forms of ion plating, before concluding with a section presenting examples of applications where ion plating is employed. Through the material presented in this book, the reader gains an understanding of the importance of ion plating technology to human progress and its various potential applications. Under the guidance of plasma physics knowledge, how to use electric and electromagnetic fields to control the space plasma will be critical to the development of new technology and systems.

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Informazioni sugli autori

Prof. Fuzhen Wang graduated from Beijing Institute of Iron and Steel in 1960, majoring in metallographic heat treatment. She began her career with the Beijing University of Technology. In 1984, she transferred to the College of Mechanical Engineering, Beijing Union University, and was promoted to Professor in 1988. In 1991, she was recognized as an outstanding expert in Beijing and enjoyed the subsidies of the State Council. Professor Wang began to study "ion plating technology" in 1976. In 1978, the first ARE (activated reactive evaporation) equipment was successfully developed in China. Professor Wang has authored two books: Surface Deposition Technology, published in 1989 and Applied Technology of Gas Deposition, 2007. In addition, in 2014 she developed a video tutorial entitled, Ion Coating Technology.

Prof. Junwei Wu is an associate professor in Harbin Institute of Technology (Shenzhen) and also serves as a deputy secretary general of Shenzhen Association of Vacuum Technology Industries (SAVTI), and is a member of the international advisory board of Society of Vacuum Coaters (SVC). He obtained his Ph.D. from West Virginia University in 2009 and has published more than 50 journal papers on both ion plating technology and mass production.

Dalla quarta di copertina

Ion plating technology utilizes plasma energy to produce thinner and finer layers with various special functions for high-tech products. With the extensive application of ion plating in the modern world, this technology has seen rapid advances taking place in recent years. Ion Plating Technology: Fundamentals and Applications discusses the fundamental concepts of plasma physics in various coating technologies and explores its development and implementation into new technologies. Recent progress of technologies and products via ion plating will be introduced. The book begins with the treatment of vacuum physics, through plasma physics. It then presents the various forms of ion plating, before concluding with a section presenting examples of applications where ion plating is employed. Through the material presented in this book, the reader gains an understanding of the importance of ion plating technology to human progress and its various potential applications. Under the guidance of plasma physics knowledge, how to use electric and electromagnetic fields to control the space plasma will be critical to the development of new technology and systems.

Dettagli dell'edizione

• Editore: Elsevier
• Data di pubblicazione: 2022
• Lingua: Inglese
• ISBN 10: 0323908330
• ISBN 13: 9780323908337
• Rilegatura: Copertina flessibile
• Numero edizione: 1
• Numero di pagine: 552
• Contatto del produttore: non disponibile
• Persona responsabile: LSWR Group; b.criscuolo@lswr.it; ; Via Spadolini, 7; Milano; Italia