Advances in Imaging and Electron Physics: 235 - Rilegato

Rilegato

ISBN 10: 044342831X ISBN 13: 9780443428319

Casa editrice: Academic Press, 2025

Riassunto

Advances in Imaging and Electron Physics, Volume 235 merges two long-running serials, Advances in Electronics and Electron Physics and Advances in Optical and Electron Microscopy. Chapters in this release cover Unified formalism of light beam optics and light polarization, Relativistic Theory and Calculation of Electrostatic Focusing Systems, A Nonlinear Representation Theory of Equivariant Deep Learning Using Group Morphology.

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Informazioni sull?autore

Dr Martin Hÿtch, serial editor for the book series “Advances in Imaging and Electron Physics (AIEP)”, is a senior scientist at the French National Centre for Research (CNRS) in Toulouse. He moved to France after receiving his PhD from the University of Cambridge in 1991 on “Quantitative high-resolution transmission electron microscopy (HRTEM)”, joining the CNRS in Paris as permanent staff member in 1995. His research focuses on the development of quantitative electron microscopy techniques for materials science applications. He is notably the inventor of Geometric Phase Analysis (GPA) and Dark-Field Electron Holography (DFEH), two techniques for the measurement of strain at the nanoscale. Since moving to the CEMES-CNRS in Toulouse in 2004, he has been working on aberration-corrected HRTEM and electron holography for the study of electronic devices, nanocrystals and ferroelectrics. He was laureate of the prestigious European Microscopy Award for Physical Sciences of the European Microscopy Society in 2008. To date he has published 130 papers in international journals, filed 6 patents and has given over 70 invited talks at international conferences and workshops.

Dalla quarta di copertina

Advances in Imaging and Electron Physics, Volume 235 merges two long-running serials, Advances in Electronics and Electron Physics and Advances in Optical and Electron Microscopy. Chapters in this release cover Characterization of nanomaterials properties using FE-TEM, Cold field-emission electron sources: From higher brightness to ultrafast beams, Every electron counts: Towards the development of aberration optimized and aberration corrected electron sources, and more. The series features articles on the physics of electron devices (especially semiconductor devices), particle optics at high and low energies, microlithography, image science, digital image processing, electromagnetic wave propagation, electron microscopy and the computing methods used in all these domains.

Dettagli dell'edizione

• Editore: Academic Press
• Data di pubblicazione: 2025
• Lingua: Inglese
• ISBN 10: 044342831X
• ISBN 13: 9780443428319
• Rilegatura: Copertina rigida
• Numero edizione: 1
• Numero di pagine: 180
• Redattore: Hÿtch
• Contatto del produttore: Academic Press; https://shop.elsevier.com/; ; 230 PARK AVENUE, SUITE 800; NY; NY; 10169; U.S.A.
• Persona responsabile: non disponibile