Sinossi
In light of the growing importance and availability of intense x-ray sources and position-sensitive detectors, this book offers comprehensive treatment of the principles, instrumentation, and applications of x-ray diffraction at elevated temperatures. Coverage explores the uses of intense x-ray sources and position-sensitive detectors for assessing these sources, and offers comparisons with complementary thermal analysis techniques (differential scanning calorimetry, thermogravimetric analysis, thermal mechanical analysis) for carrying out phase identification, texture analysis, and grain size measurement by way of in situ process analysis at elevated temperatures in a broad range of fields, including crystallography, thermal analysis, materials science, chemical and electrical analysis.
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Dalla quarta di copertina
X-Ray Diffraction at Elevated Temperatures A Method for in Situ Process Analysis D. D. L. Chung P.W. DeHaven H. Arnold Debashis Ghosh This book offers a comprehensive treatment of the principles, instrumentation, and applications of x-ray diffraction at elevated temperatures. Coverage explores the uses of intense x-ray sources and position-sensitive detectors for assessing these sources, and offers comparisons with complementary thermal analysis techniques (differential scanning calorimetry, thermogravimetric analysis, thermal mechanical analysis). It describes phase identification, texture analysis, and grain size measurement by way of the in situ process analysis at elevated temperatures. It promotes the use of x-ray diffraction at elevated temperatures in a broad range of fields, including crystallography, thermal analysis, materials science, and chemical and electrical engineering.
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