Articoli correlati a Semiconductor Device and Failure Analysis: Using Photon...

Semiconductor Device and Failure Analysis: Using Photon Emission Microscopy - Rilegato

Chim, Wai Kin

 
9780471492405: Semiconductor Device and Failure Analysis: Using Photon Emission Microscopy
Rilegato
ISBN 10: 047149240X ISBN 13: 9780471492405
Casa editrice: Wiley, 2000

Sinossi

Integrierte Schaltkreise werden immer komplexer - deshalb wird es zunehmend schwieriger, Fehler schnell und treffsicher aufzuspüren. Die Photonenemissionsmikroskopie (PEM) ist eine Analysetechnik auf physikalischer Grundlage, die sich als Fehlererkennungsmethode bewährt hat. Dieser Band erläutert alle Aspekte dieser Methode, von der instrumentellen Ausrüstung über spezifische Details der Mikroskope bis hin zu Merkmalen der Photonenemission unter verschiedenen Bedingungen. (11/00)

Le informazioni nella sezione "Riassunto" possono far riferimento a edizioni diverse di questo titolo.

Informazioni sull'autore

Wai Kin Chim is the author of Semiconductor Device and Failure Analysis : Using Photon Emission Microscopy , published by Wiley.

Dalla quarta di copertina

The diminishing size and greater complexity of modern semiconductor integrated circuits poses new challenges in fault detection. Photon Emission Microscopy (PEM) is a physical fault localisation technique used for analysing IC failures. Detailing the PEM technique and its application to semiconductor device analysis, this unique reference:
* Illustrates the application of the PEM technique in various areas of device reliability, in particular hot-carrier, oxide and ESD reliability.
* Presents the principles of design and calibration for a spectroscopic emission microscope system along with coverage of the three main operation modes: frontside, backside and spectroscopic PEM
* Provides an analysis of light emission in semiconductors under hot-carrier and high-field impulse stressing in MOS transistors and photon emission from biased MOS capacitors.
Not only an essential reference for researchers and students in the field, the numerous practical examples throughout the text also make this an indispensible guide for failure analysis engineers and microelectrics industry professionals.

Dal risvolto di copertina interno

The diminishing size and greater complexity of modern semiconductor integrated circuits poses new challenges in fault detection. Photon Emission Microscopy (PEM) is a physical fault localisation technique used for analysing IC failures. Detailing the PEM technique and its application to semiconductor device analysis, this unique reference:
* Illustrates the application of the PEM technique in various areas of device reliability, in particular hot-carrier, oxide and ESD reliability.
* Presents the principles of design and calibration for a spectroscopic emission microscope system along with coverage of the three main operation modes: frontside, backside and spectroscopic PEM
* Provides an analysis of light emission in semiconductors under hot-carrier and high-field impulse stressing in MOS transistors and photon emission from biased MOS capacitors.
Not only an essential reference for researchers and students in the field, the numerous practical examples throughout the text also make this an indispensible guide for failure analysis engineers and microelectrics industry professionals.

Le informazioni nella sezione "Su questo libro" possono far riferimento a edizioni diverse di questo titolo.

Editore
Wiley
Data di pubblicazione
2000
Lingua
Inglese
ISBN 10 
047149240X
ISBN 13 
9780471492405
Rilegatura
Copertina rigida
Numero edizione
1
Numero di pagine
288
Contatto del produttore
non disponibile
Persona responsabile
Wiley-VCH GmbH
product_safety@wiley.com

Boschstrasse 12
Weinheim
69469
Germania