Electron Microscopy and Analysis 1993, Proceedings of the Institute of Physics Electron Microscopy and Analysis Group Conference, University of Liverpool, 14-17 September 1993 - Rilegato

Institute Of Physics (Great Britain) Electron Microscopy And Analysis Group; Royal Microscopical Society (Great Britain); Institute Of Materials (London, England)

Rilegato

ISBN 10: 0750303212 ISBN 13: 9780750303217

Casa editrice: CRC Press, 1994

Riassunto

These proceedings cover developments in imaging, diffraction and spectroscopy in the electron microscope, together complementary and competing techniques such as scanning optical and scanning stylus microscopies. A valuable reference source for researchers involved in the use of electron microscopy in physics, materials science and chemistry.

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Contenuti

Preface. Section 1: Plenary lectures, Micromagnetics, microstructure and microscopy (J N Chapman et al). Heterogeneous catalysis: the ultimate challenge for electron microscopy? (R W Joyner). UHV microscopy of surfaces and thin film growth (K Takayanagi). Section 2: Microanalysis, High spatial resolution mapping of EELS fine structures (C Colliex). Determination of the crystal field strength in manganese compounds by parallel electron energy loss spectroscopy (L A J Garvie and A J Craven). Electron energy loss near edge spectroscopy of oxygen in amorphous and crystalline WO^O3 and MoO^O3 (G Mountjoy et al). Microanalysis of an oxidized cobalt oxide-zirconia eutectic (J Bentley et al). The orientation dependence of the Cu L loss as assessed BY PEELS for YBa^O2Cu^O3O^O7-8 (G A Botton et al). PEELS of crystalline and amorphous silicon oxides (D J Wallis et al). A comparative electron energy-loss spectroscopy study of cuprous and cupric chromites (F J Cadete Santos Aires). Cobalt, nickel and copper aluminates characterised by parallel EELS (F J Cadete Santos Aires). Quantitative electronic structure analysis of ^Oa-Al^O2O^O3 using spatially resolved valence electron energy-loss spectra (H M^D"ullejans et al). Relationship between electron energy loss and interparticle dispersion force (J Yuan). The effect of grain size on e,ectron beam hole drilling in CaF^O2 (R Zanetti et al). Electron beam induced nanoscale chemical reactions (Y Murooka and J Yuan). An investigation of the mass loss from chlorinated copper phthalocyanines using PEELS (A J Craven and J M Smith). Investigations of structure and degradation of carbon nanotubes by EELS and HREM (S L Cullen et al). Three-dimensional morphology and microstructrue of graphite shells (R Vincent et al). A study of sample thickness dependence in electron beam hole-drilling or inorganic materials (R M Allen et al). Coincidence experiments on the secondary electron emission from copper particles and oxidised aluminium (M Overdick and A L Bleloch). The application of multivariate ALCHEMI to materials containing light elements (M G Walls). X-ray mapping without a STEM? (J M Brock et al). X-ray microanalysis of thin films using Monte Carlo simulations (A G Fitzgerald et al). A pre-viewing method for determining homogeneity of a metal bulk sample prior to quantification of the EDS-spectra (T E Gustafsson). Intensity distribution in defocused STEM probes (S J R Granleese et al). The information from bright field images of small particles (S A Sethi and A R Th^D"ol^D'en). Section 3: Electron diffration; Advances in coherent electron diffraction (R Vincent et al). Accurate structure factor refinement from zone-axis CBED patterns (M Saunders et al). Structure factors and charge density of ^IyTiAl; a comparison of ^Iab initio local density calculations with data from electron diffraction experiments (A G Fox et al). Structure determination of organic crystals by electron crystallography (J R Fryer et al). Structure factor determination by zone axis CBED (W G Burgess et al). Debye-Waller factor measurements in TiAl from HOLZ line intensities (R Holmestad et al). Debye-Waller factor determination from LACBED patterns (A R Preston et al). Dynamical effects of high-energy electron diffraction observed in ZnS (H Matsuhata and J Gj^D/onnes). Characterisation of the Burgers vectors of partial dislocations by large angle convergent beam electron diffraction (J P Morniroli and D Cherns). Determination of beam directions and axis/angle pairs for grain boundaries in hexagonal materials (I MacLaren and M Aindow). Fast calibration of CBED patterns for structure factor refinement (M A Gribelyuk and M R^D"uhle). Determination of the space group of hydrothermally synthesised K^O2MgSi^O5O^O12 leucite by electron diffraction (P E Champness). Information in Ronchigrams of a superlattice from defocused microdiffraction in STEM (P R Aitchison et al). Speckle interference in selected area transmission electron diffraction patterns (A C Daykin). Multiple inelastic scaattering contributions to CBED contrast (R H^D/oier and K Marthinsen). Principles of the measurement of composition and strain in epitaxial layers using convergent beam electron diffraction (R Beamland and P J Goodhew). Application of Dyson and Bethe-Salpeter equations to high-energy electron diffraction (S L Dudarev et al). Section 4: Surface analysis; Multi-source imaging in photoelectron spectromicroscopy (C D Coath et al). UV photoelectron microscopy using Fresnel zone plates (S Anjum et al). Biassed secondary electron imaging of Cs/Si(100) (M Azim et al). Auger imaging from rough, chemically inhomogeneous, materials (M Crone et al). Hydrogenated amorphous silicon (a-Si:H) films containing tungsten (A Ploessl et al). High resolution profile imaging of (Hg, Mn)Te (P D Brown et al). Internal scattering of electrons in a CMA (T A El Bakush et al). Surface resonance scattering of high energy electrons by crystals: exact analytical solution (S L Dudarev and M J Whelan). THEED of sub-monolayer phases of xenon adsorbed on graphite (T E A Zerrouk et al). Section 5: High resolution imaging; Ultra-resolution on a FEG-TEM by phase retrieval through focus variation (W Coene et al). Simple focal series integration for optimized phase contrast in TEM (A H Buist and P Kruit). Below the l ^DoA Coherent resolution limit: does the future lie with STEM? (J M Rodenburg). Image resolution improvement using coherent microdiffraction in STEM (P D Nellist and J M Rodenburg). Thickness limitations of aberration-free projection imaging (T Plamann and J M Rodenburg). Experimental super resolution via tilt series recronstruction in the CTEM (A I Kirkland et al)>Direct complex transfer function reconstruction by processing of near-focus shadow images in STEM (M N Landauer and J M Rodenburg). Applications of the optical moir^D'e technique in HREM (C J D Hetherington et al). HREM structure characterization of interfaces in epitaxial MBE grown multilayers based on GaAs and GaSb (K Scheerschmidt et al). HREM studies of CVD-diamond films (J L Hutchinson and D Schechtman). An HREM investigation of the diamond hexagonal phase in a silicon cone from a vacuum microelectronic device (C J Morgan et al). The characterisation of delta-doping in gallium arsenide by Fresnel contrast (R E Dunin-Borkowski et al). Section 6: Scanned probe techniques; The study of conjugated plymers by STM and related methods (S F Bond et al). An ECSTM study of the electrodepostion of Ni onto HOPG substrates (K N Riddell et al). TEM and STM studies of growth spirals on laser-ablated epitaxial YBa^O2Cu^O3O^O7-8 (M Yeadon et al). The combination of low resolution STM and conventional TEM in the study of nanoindentation plasticity on tungsten single crystals (N A Stelmashenko et al). Scanning tunneling and atomic force microscopy studies on organometallic compounds (S Mulley et al). Section 7: Materials analysis; The moderm SEM: an increasingly versatile and integrated tool for the microstructural and microchemical analysis of engineering ceramics, coatings and composites (T F Page). Dislocation stand-off and its effect on orientation relationship (D M Tricker et al). Electron microscopy studies of epitaxial CuInSe^O2 layers grown on GaAs by a hybrid magnetron sputtering process (C A Mullan et al). Electron microscopy studies of epitaxial InGaAlAs layers grown on InP(001) by molecular beam epitaxy (R T Murray et al). TEM and PL study of strain relaxation in InGaAs/GaAs MQW structures (D Gonz^D'alez et al). Characterization of the GaP/Si(001) interface by transmission electron microscopy (F J Pacheco et al). TEM and PL imaging characterization of MOVPE grown multiple quantum well laser structures with tensile strained GA^OxIn^O1-xAs wells (X Zhou et al). TEM investigation of the magnetic structures present in amorphous ribbons (L J Heyderman et al). The characterisation of thin films of MBE grown La^O2-xSr^OxCuO^O4+^O8 by transmission electron microscopy (E J Williams et al). Growth and microstructure of aluminium substituted YBa^O2Cu^O3O^O7-8 single crystals (A Dra
ke et al). Low temperature SEM studies of beam-induced voltage contrast in YBCO thin films (C A Hollin et al). Dislocation parity analysis applied to unify the Burgers vector determination by TEM (S S Ruvimov and K Scheerschmidt). Phase transformations in UPt^O3 revealed by ^Iin-situ heating (P A Midgley et al). TEM specimen preparation of nanophase materials by ultramicrotomy (G McMahon and T Malis). Electron microscopy of silicon nitride whiskers (P Korgul). Ternary phase formation in flip-chip solder bonds (A J Mockler et al). The stability of dispersoids in mechanically alloyed ferritic ODS alloys (H Cama and T A Hughes). A STEM/PEELS-study of debris produced by friction of a diamond stylus on CVD diamond (F M van Bouwelen et al). Electron-induced crystallisation in aluminium trifluoride (G S Chen et al). Orientation changes during sintering of nickel (D J Dingley et al). The orientation of grain boundaries in annealed copper (D J Dingley et al). Section 8: Composite materials; Application of electron microscopy and microanalysis to the development of advanced structural composite materials (D Imeson). Transmission electron microscopy of BN inclusions in Si^O3N^O4-SiC composites (S Turan and K M Knowles). Interfacial reaction products and matrix microstructures in SCS-6/*B-Ti metal matrix composites (M Strangwood et al). Electron microscopy of AlN-SiC interfaces and solid solutions (J Bentley et al). Section 9: Metals and alloys; Surface and interface segregation in nickel-based alloys (G J Tatlock et al). Cooling induced segregations to grain boundaries in 2 1/4CrlMo steel and submerged arc weld metal (V Vorlicek and P E J Flewitt). Compositional segregation at fault interfaces in ^Oy' (C Y Chen et al). A comparison of assessments of grain boundary segregation using the Fresnel method and HAADF imaging (D ^D"Ozkaya et al). STEM analysis of impurity segregation during high temperature oxidation (P Fox). The study of grain boundary void development in an Al-3wt% Li alloy (D ^D"Ozkaya et al). A TEM investigation of sub-micron precipitate dispersions in laser welded Al-Li based alloy 8090 (I R Whitaker et al). Intermediate compounds in ^Oy/y' alloy coatings (A Dent). Ordering in Nb-A1 alloys with 10 to 25 atomic % A1 (L S Smith et al). Planar defects in a ^Oy-based Ti48A12Mo alloy (Y G Li and M H Loretto). A HREM investigation of dislocation pinning by 1/6dipoles (B J Inkson). Determination of stacking fault energies of the intermetallic Ti-52at.% A1 (J M K Wiezorek and C J Humphreys). The nature of the ^Oy allotriomorph/^Ia^O2 + ^Oy lamellae interface for elevated temperature transformations in Ti-48-A1-2Mn-2Nb (S P Godfrey and M Strangwood). The stability of melt-spun A1-transition metal alloys (M A Duggan et al). Nanostructure investigation of rapi8dly solidified NdFeB hard magnetic alloys (M A Al-Khafaji et al). Section 10: Catalysis; Controlled environment TEM of a 5% Pt/A1^O2O^O3 model catalyst (E G Bithnell et al). ^IIn-situ oxidation and reduction of complex oxides (J L Hutchison et al). Transmission electron microscopy and energy dispersive x-ray spectroscopy studies of Pt-Re/^OyA1^O2O^O3 catalysts (Z Huang et al). Transmission electron microscopy and energy dispersive x-ray spectroscopy studies of Pt-Sn/^OyA1^O2O^O3 catalysts (Z Huang et al). Preparation and characterisation of platinum group metal nanoparticles (F Cea et al). A structural study of the WO^O3/TiO^O2 (anatase) monolayer catalyst using high resolution electron microscopy (A Burrows et al. HREM study of the phases resulting from the preparation of ceria supported rhodium catalysts (S Bernal et al). Section 11: New instrumentation and techniques; Orientation imaging microscopy (B L Adams). New generation SEM integrating 0.5 nm image resolution and sub-micron low voltage EDX chemical microanalysis (E D Boyes). First results of a 300 kV high resolution field-emission STEM (H S von Harrach et al). The new CM-series TEMs: integration of a five-axis motorized, fully computer-controlled goniometer (P Emile et al). Electron phase gratings by electron beam nanolithography (Y Ito et al). Beam stabiliser for an electron spectrometer (D McMullan). Energy resolved microscopy using the Gatan imaging PEELS (P A Midgley et al). An automated parallel EELS and digital image acquisition system for a VG HB501 STEM (K Tahir et al). X-ray detection performance of a 300 kV field emission analytical electron microscope (A W Nicholls et al). On-line alignment system for TEM using a TV and personal computer (F Hosokawa et al). Development of a 300 kV field emission ATEM (T Tomita et al). Author index. Subject index.

Dettagli dell'edizione

• Editore: CRC Press
• Data di pubblicazione: 1994
• Lingua: Inglese
• ISBN 10: 0750303212
• ISBN 13: 9780750303217
• Rilegatura: Copertina rigida
• Numero edizione: 1
• Numero di pagine: 546
• Redattore: Craven A. J.
• Contatto del produttore: non disponibile
• Persona responsabile: non disponibile