Sinossi
This work describes advances in the field of scanning probe lithography (SPL), a high resolution patterning technique that uses a sharp tip in close proximity to a sample to pattern nanometer-scale features on the sample. SPL is capable of patterning sub-30nm features with nanometer-scale alignment registration. It is a relatively simple, inexpensive, reliable method for patterning nanometer-scale features on various substrates. It has potential applications for nanometer-scale research, for maskless semiconductor lithography, and for photomask patterning. The authors of this book have been key players in this exciting new field. Calvin Quate has been involved since the beginning in the early 1980s. Hyongsok Tom Soh and Kathryn Wilder Guarini have been the members of this group whoin have brought about remarkable series of advances in SPM lithography. Some of these advances have been in the control of the tip which has allowed the scanning speed to be increased from m/second to mm/second. Both non-contact and in-contact writing have been demonstrated as has controlled writing of sub-100 nm lines over large steps on the substrate surface. The engineering of a custom-designed MOFSET built into each microcantilever for individual current control is another notable achievement. Micromachined arrays of probes each with individual control have been demonstrated. One of the most intriguing new aspects is the use of directly-grown carbon nanotubes as robust, high-resolution emitters. In this book the authors describe the historical context, the relevant inventions, and the prospects for eventual manufacturing use of this exciting new technology.
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Contenuti
List of Figures. List of Tables. Glossary. Foreword. Preface. Acknowledgments. 1. Introduction to Scanning Probe Lithography. 2. SPL by Electric-Field-Enhanced Oxidation. 3. Resist Exposure Using Field-Emitted Electrons. 4. SPL Linewidth Control. 5. Critical Dimension Patterning Using SPL. 6. High Speed Resist Exposure With a Single Tip. 7. On-Chip Lithography Control. 8. Scanning Probe Tips for SPL. 9. Scanning Probe Arrays for Lithography. Epilog. List of Publications. Index.
Product Description
Book by Soh Hyongsok T Guarini Kathryn Wilder Quate Calvin
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Buch. Condizione: Neu. This item is printed on demand - it takes 3-4 days longer - Neuware -Scanning Probe Lithography (SPL) describes recent advances in the field of scanning probe lithography, a high resolution patterning technique that uses a sharp tip in close proximity to a sample to pattern nanometer-scale features on the sample. SPL is capable of patterning sub-30nm features with nanometer-scale alignment registration. It is a relatively simple, inexpensive, reliable method for patterning nanometer-scale features on various substrates. It has potential applications for nanometer-scale research, for maskless semiconductor lithography, and for photomask patterning. The authors of this book have been key players in this exciting new field. Calvin Quate has been involved since the beginning in the early 1980s and leads the research time that is regarded as the foremost group in this field. Hyongsok Tom Soh and Kathryn Wilder Guarini have been the members of this group who, in the last few years, have brought about remarkable series of advances in SPM lithography. Some of these advances have been in the control of the tip which has allowed the scanning speed to be increased from mum/second to mm/second. Both non-contact and in-contact writing have been demonstrated as has controlled writing of sub-100 nm lines over large steps on the substrate surface. The engineering of a custom-designed MOSFET built into each microcantilever for individual current control is another notable achievement. Micromachined arrays of probes each with individual control have been demonstrated. One of the most intriguing new aspects is the use of directly-grown carbon nanotubes as robust, high-resolution emitters. In this book the authors concisely and authoritatively describe the historical context, the relevant inventions, and the prospects for eventual manufacturing use of this exciting new technology. 228 pp. Englisch. Codice articolo 9780792373612
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Gebunden. Condizione: New. Dieser Artikel ist ein Print on Demand Artikel und wird nach Ihrer Bestellung fuer Sie gedruckt. Scanning Probe Lithography (SPL) describes recent advances in the field of scanning probe lithography, a high resolution patterning technique that uses a sharp tip in close proximity to a sample to pattern nanometer-scale features on the sample. Codice articolo 5970101
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Condizione: New. Describes advances in the field of scanning probe lithography, a high resolution patterning technique that uses a sharp tip in close proximity to a sample to pattern nanometer-scale features on the sample. This book describes the historical context, the relevant inventions, and the prospects for eventual manufacturing use of this technology. Series: Microsystems. Num Pages: 197 pages, biography. BIC Classification: TJFD5. Category: (P) Professional & Vocational; (UP) Postgraduate, Research & Scholarly; (UU) Undergraduate. Dimension: 235 x 155 x 14. Weight in Grams: 498. . 2001. Hardback. . . . . Codice articolo V9780792373612
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Buch. Condizione: Neu. Scanning Probe Lithography | Hyongsok T. Soh (u. a.) | Buch | Microsystems | xxiii | Englisch | 2001 | Springer | EAN 9780792373612 | Verantwortliche Person für die EU: Springer Verlag GmbH, Tiergartenstr. 17, 69121 Heidelberg, juergen[dot]hartmann[at]springer[dot]com | Anbieter: preigu Print on Demand. Codice articolo 102549638
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Buch. Condizione: Neu. This item is printed on demand - Print on Demand Titel. Neuware -Scanning Probe Lithography (SPL) describes recent advances in the field of scanning probe lithography, a high resolution patterning technique that uses a sharp tip in close proximity to a sample to pattern nanometer-scale features on the sample. SPL is capable of patterning sub-30nm features with nanometer-scale alignment registration. It is a relatively simple, inexpensive, reliable method for patterning nanometer-scale features on various substrates. It has potential applications for nanometer-scale research, for maskless semiconductor lithography, and for photomask patterning.The authors of this book have been key players in this exciting new field. Calvin Quate has been involved since the beginning in the early 1980s and leads the research time that is regarded as the foremost group in this field. Hyongsok Tom Soh and Kathryn Wilder Guarini have been the members of this group who, in the last few years, have brought about remarkable series of advances in SPM lithography. Some of these advances have been in the control of the tip which has allowed the scanning speed to be increased from mum/second to mm/second. Both non-contact and in-contact writing have been demonstrated as has controlled writing of sub-100 nm lines over large steps on the substrate surface. The engineering of a custom-designed MOSFET built into each microcantilever for individual current control is another notable achievement. Micromachined arrays of probes each with individual control have been demonstrated. One of the most intriguing new aspects is the use of directly-grown carbon nanotubes as robust, high-resolution emitters.In this book the authors concisely and authoritatively describe the historical context, the relevant inventions, and the prospects for eventual manufacturing use of this exciting new technology.Springer-Verlag GmbH, Tiergartenstr. 17, 69121 Heidelberg 228 pp. Englisch. Codice articolo 9780792373612
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