This book elucidates the reasons underlying the lasting success of DNQ/N resist systems by examining the correlation between the chemical structure of the components and the photoresist performance. The basic chemistries of both DNQ sensitizers and novolak resins are explored. Focus also is placed on the chemical basis of application-related facets of the lithographic process. Methods of increasing process performance, such as image reversal, top layer imaging, antireflection layers, and phase shift technology are treated.Contents - Preface to the Series - Table of Contents - Preface - Introduction - Basic Chemistry of DNQ/Novolak Resists - Basic Chemistry of Novolaks - DNQ/Novolak Interactions - Step-by-step View of the Lithographic Process - Advanced Processing Schemes for DNQ Resists - Outlook on DNQ/Novolak Systems
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Da: HPB Inc., Dallas, TX, U.S.A.
paperback. Condizione: Very Good. Connecting readers with great books since 1972! Used books may not include companion materials, and may have some shelf wear or limited writing. We ship orders daily and Customer Service is our top priority! Codice articolo S_471604710
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Da: Ammareal, Morangis, Francia
Softcover. Condizione: Bon. Ancien livre de bibliothèque avec équipements. Edition 1993. Tome 11. Ammareal reverse jusqu'à 15% du prix net de cet article à des organisations caritatives. ENGLISH DESCRIPTION Book Condition: Used, Good. Former library book. Edition 1993. Volume 11. Ammareal gives back up to 15% of this item's net price to charity organizations. Codice articolo G-740-116
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Da: Moe's Books, Berkeley, CA, U.S.A.
Soft cover. Condizione: Very good. No jacket. In great condition. Binding is tight and inside is clean and unmarked. Codice articolo 1153703
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