Microlithography: Science and Technology - Rilegato

Rilegato

ISBN 10: 0824799534 ISBN 13: 9780824799533

Casa editrice: CRC Press, 1998

Riassunto

This self-contained text details both elementary and advanced aspects of submicron microlithography - providing a balanced treatment of theoretical and operating practices as well as complete information on current research in the field. Including discussions on electron beam, x-ray, and proximal probe techniques and enhanced with timesaving citations to key sources in the literature and more than 600 tables, equations, drawings, and photographs that clarify the material, the book covers mechanical systems, optics, excimer laser light sources, alignment techniques and analysis, resist chemistry, processing, multilayer lithography, plasma and reactive ion etching, metrology, and more.

Su questo libro

Contenuti

EXPOSURE SYSTEMS
System Overview of Optical Steppers and Scanners, M.S. Hibbs
Optical Lithography Modeling, C.A. Mack
Optics for Photolithography, B.W. Smith
Krypton Fluoride Excimer Laser for Advanced Microlithography, P. Das and U. Sengupta
Alignment and Overlay, G.M. Gallatin
Electron Beam Lithography Systems, G. Owen and J.R. Sheats
X-Ray Lithography, T. Ueno and J.R. Sheats

RESISTS AND PROCESSING
Chemistry of Photoresist Materials, T. Ueno
Resist Processing, B.W. Smith
Multilayer Resist Technology, B.W. Smith and M. Hanratty
Dry Etching of Photoresists, R.R. Kunz

METROLOGY AND NANOLITHOGRAPHY
Dimensional Metrology, H.M. Marchman
E-Beam and Proximal Probe Processes for Nanolithography, E.A. Dobisz, F.K. Perkins, and M.C. Peckerar

Product Description

Book by Arlov Pamela Arlov Pamela

Dettagli dell'edizione

• Editore: CRC Press
• Data di pubblicazione: 1998
• Lingua: Inglese
• ISBN 10: 0824799534
• ISBN 13: 9780824799533
• Rilegatura: Copertina rigida
• Numero edizione: 1
• Numero di pagine: 800
• Redattore: Smith Bruce W., Suzuki Kazuaki
• Contatto del produttore: non disponibile
• Persona responsabile: non disponibile