Microelectronic Processing: Inorganic Materials Characterization: 295 - Rilegato

Rilegato

ISBN 10: 0841209340 ISBN 13: 9780841209343

Casa editrice: American Chemical Society, 1999

Riassunto

Examines leading-edge developments in the field of materials development. Covers all major aspects of materials science, with applications to many high technology areas. Explores the role of chemistry in high-tech materials and their applications.

Su questo libro

Contenuti

• Analytical Approaches and Expert Systems in the Characterization of Microelectronic Devices
• Electrical Characterization of Semiconductor Materials and Devices
• Dopant Profiles by the Spreading Resistance Technique
• SEM Techniques for Characterization of Semiconductor Materials
• Semiconductor Materials Defect Diagnostics for Submicron VLSI Technology
• Applications of Secondary Ion Mass Spectroscopy to Characterization of Microelectronic Materials
• Applications of Auger Electron Spectroscopy in Microelectronics
• X-Ray Photoelectron Spectroscopy Applied to Microelectronic Materials
• Application of Neutron Depth Profiling to Microelectronic Materials Processing
• Thermal-Wave Measurement of Thin Film Thickness
• Characterization of Materials, Thin Films, and Interfaces by Optical Reflectance and Ellipsometric Techniques
• Measurement of the Oxygen and Carbon Content of Silicon Wafers by Fourier Transform Spectrophotometry
• Application of the Raman Microprobe to Analytical Problems of Microelectronics
• Characterization of GaAs by Magneto-Optical Photoluminescent Spectroscopy
• Thermal-Wave Imaging in a Scanning Electron Microscope
• Fourier Transform Mass Spectrometry in the Microelectronics Service Laboratory
• Materials Characterization Using Elemental and Isotope Analysis by Inductively Coupled Plasma Mass Spectrometry (ICP-MS)
• Activation Analysis of Electronics Materials
• Trace Element Survey Analyses by Spark Source Mass Spectrography (SSMS)
• Characterization of Components in Plasma Phosphorus Doped Oxides
• Process Control of Vacuum-Deposited Nickel-Chromium for the Fabrication of Reproducible Thin Film Resistors
• Characterization of Spin-On Glass Films as a Planarizing Dielectric
• Effects of Various Chemistries on Silicon Wafer Cleaning
• Monitoring of Particles in Gases Using a Laser Counter
• Microelectronics Processing Problem Solving: The Synergism of Complementary Techniques

Dettagli dell'edizione

• Editore: American Chemical Society
• Data di pubblicazione: 1999
• Lingua: Inglese
• ISBN 10: 0841209340
• ISBN 13: 9780841209343
• Rilegatura: Copertina rigida
• Numero di pagine: 456
• Redattore: Casper Lawrence
• Contatto del produttore: non disponibile
• Persona responsabile: non disponibile