Polymers for Microelectronics: Resists and Dielectrics: 537 - Rilegato

Rilegato

ISBN 10: 0841227217 ISBN 13: 9780841227217

Casa editrice: American Chemical Society, 1994

Riassunto

Presents recent advances in chemically amplified resists for deep UV, electron beam, and X-ray advanced lithographic technologies. Discusses top surface imaging and dry development resists. Examines the fundamental chemistry of radiation-sensitive materials, including dielectric polymers for integrated circuits and interconnect systems. Valuable reading for polymer chemists, radiation chemists, and materials scientists.

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Contenuti

• E.Reichmanis, F. M. Houlihan, O. Nalamasu, and T.X. Neenan: Chemical Amplification Mechanisms for Microlithography
• F.M. Houlihan, E. Chin, O. Nalamasu, and J. M. Kometani: Synthesis of 4-(tert-Butoxycarbonyl)-2,6-dinitrobenzyl Tosylate: A Potential Generator and Dissolution Inhibitor Solubilizable through Chemical Amplification
• Y. Jiang and D.R. Bassett: Chemically Amplified Deep-UV Photoresists Based on Acetal-Protected Poly(vinylphenols)
• N. Takeyama, Y. Ueda, T. Kusumoto, H. Ueki, and M. Hanabata: Novel Analytic Method of Photoinduced Acid Generation and Evidence of Photosensitization via Matrix Resin
• H. Ito, Y. Maekawa, R. Sooriyakumaran, and E. A. Mash: Acid-Catalyzed Dehydration: A New Mechanism for Chemically Amplified Lithographic Imaging
• E. Kobayashi, M. Murata, M. yamachika, Y. Kobayashi, Y. Yumoto, and T. Miura: An Alkaline-Developable Positive Resist Based on Silylated Polyhydroxystyrene for KrF Excimer Laser Lithography
• W.D. Hinsberg, S. A. MacDonald, C. D. Snyder, H. Ito, and R. D. Allen: A Test for Correlation between Residual Solvent and Rates of N-Methylpyrrolidone Absorption by Polymer Films
• C.-P. Lei, T. Long, S. K. Obendorf, and F. Rodriguez: Dissolution Rates of Copolymers Based on 4-Hydroxystyrene and Styrene
• K.-D. Ahn and D.-I. Koo: Synthesis and Polymerization of N-(tert-Butoxy)maleimide and Application of Its Polymers as a Chemical Amplification Resist
• Y. Inaki, N. Matsumura, and K. Takemoto: Acid-Sensitive Pyrimidine Polymers for Chemical Amplification Resists
• R. D. Allen, G. M. Wallraff, W. D. Hinsberg, L. L. Simpson, and R.R Kunz: Methacrylate Terpolymer Approach in the Design of a Family of Chemically Amplified Positive Resists
• M. Shirai and M. Tsunooka: Surface-Imaging Resists Using Photogenerated Acid-Catalyzed SiO[2 Formation by Chemical Vapor Deposition
• K. Watanabe, E. Yano, T. Namiki, and Y. Yoneda: Polysilphenylenesiloxane Resist with Three-Dimensional Structure
• J. M. Calvert, W. J. Dressick, C. S. Dulcey, M. S. Chen, J. H. Georger, D.A. Stenger, T.S. Koloski, and G.S. Calabrese: Top-Surface Imaging Using Selective Electroless Metallization of Patterned Monolayer Films
• V. Rao, W.D.Hinsberg, C.W. Frank, and R.F.W. Pease: Langmuir-Blodgett Deposition To Evaluate Dissolution Behavior of Multicomponent Resists
• J.R. Sheats: Photochemical Control of a Morphology and Solubility Transformation in Poly(vinyl alcohol) Films Induced by Interfacial Contact with Siloxanes and Phenol-Formaldehyde Polymeric Photoresists
• R. Dammel: Advances in the Chemistry of Resists for Ionizing Radiation
• M.T. Pottiger and J.C. Coburn: Out-of-Plane Expansion Measurements in Polyimide Films
• M.F. Welker, H. R. Allcock, G. L. Grune, R. T. Chern, and V. T. Stannett: Radiation-Induced Modifications of Allylamino-Substituted Polyphosphazenes
• S. Ando, T, Matsuura, and S. Sasaki: Synthesis of Perfluorinated Polyimides for Optical Applications
• K. Ushida, A. Kira, S. Tagawa, Y. Yoshida, and H. Shibata: Charged Species in *s-Conjugated Polysilanes as Studied by Absorption Spectroscopy with Low-Temperature Matrices
• W. Brunsvold, W. Conley, W. Montgomery, and W. Moreau: Acid-Sensitive Phenol-Formaldehyde Polymeric Resists
• S.X. Cai, M.N. Wybourne, and J.F.W. Keana: Superiority of Bis(perfluorophenyl) Azides over Nonfluorinated Analogues as Cross-Linkers in Polystyrene-Based Deep-UV Resists
• T. Nishikubo, A. Kameyama, K. Kishi, and C. Hijikata: New Photoresponsive Polymers Bearing Norbornadiene Moiety Synthesis by Selective Cationic Polymerization of 2-(3-Phenyl-2,5-norbornadiene-2-carbonyloxy)ethyl Vinyl Ether and Photochemical Reaction of the Resulting Polymers
• E. Zenkl, M. Schimetta, and F. Stelzer: Photoinitiated Thermolysis of Poly(5-norbornene 2, 3-dicarboxylates): A Way to Polyconjugated Systems and Photoresists
• D. Makino: Recent Progress of the Application of Polyimides to Microelectronics
• W. Volksen, T. Pascal, J.W. Labadie, and M.I. Sanchez: Base-Catalyzed Cyclization of ortho-Aromatic Amide Aklyl Esters: A Novel Approach to Chemical Imidization
• D.R. McKean, G.M. Wallraff, W. Volksen, N.P. Hacker, M.I. Sanchez, and J.W. Labadie: Base-Catalyzed Photosensitive Polyimide
• A.N.K. Lau and L.P. Vo: Novel Cross-Linking Reagents Based on 3,3-Dimethyl-1-phenylenetriazene
• T. Yamashita and K. Horie: Preparation of Novel Photosensitive Polyimide Systems via Long-Lived Active Intermediates
• Y. Kawanishi, T. Tamaki, and K. Ichimura: Photoregulation of Liquid-Crystalline Orientation by Anisotropic Photochromism of Surface Azobenzenes
• V.-T. Truong, and B. C. Ennis: Factors Affecting the Stability of Polypyrrole Films at Higher Temperatures
• M. Ree and D.P. Kirby: Intrinsic and Thermal Stress in Polyimide Thin Films
• B.C. Auman and S. Trofimenko: Fluorinated, Soluble Polyimides with High-Glass-Transition Temperatures Based on a New, Rigid, Pentacyclic Dianhydride: 12,14-Diphenyl-12,14-bis(trifluoromethyl )-12H,14H-5,7-dioxapentacene-2,3,9,10-tetracarboxylic Dianhydride
• H.S.-W. Hu, and J.R. Griffith: Processable Fluorinated Acrylic Resins with Low Dielectric Constants
• C.R. Davis and F.D. Egitto: Enhanced Processing of Poly(tetrafluoroethylene) for Microelectronics Applications
• F. W. Mercer, D.W. Duff, T. D. Goodman, and J. B. Wojtosicz: Fluorinated Poly(arylene ethers) with Low Dielectric Constants
• A. Eftekhari, A. K. St. Clair, D.M. Stoakley, D. R. Sprinkle, and J.J. Singh: Microstructural Characterization of Thin Polyimide Films by Positron Lifetime Spectroscopy
• F. W. Mercer, C. Coffin, and D.W. Duff: Synthesis and Characterization of New Poly(arylene ether oxadiazoles)

Product Description

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Dettagli dell'edizione

• Editore: American Chemical Society
• Data di pubblicazione: 1994
• Lingua: Inglese
• ISBN 10: 0841227217
• ISBN 13: 9780841227217
• Rilegatura: Copertina rigida
• Numero di pagine: 554
• Redattore: Thompson Larry F., Willson C. Grant, Tagawa Seiichi
• Contatto del produttore: non disponibile
• Persona responsabile: non disponibile