Polymeric Materials for Microelectronic Applications: Science and Technology: 579 - Rilegato

Rilegato

ISBN 10: 0841230552 ISBN 13: 9780841230552

Casa editrice: American Chemical Society, 1995

Riassunto

Reports recent developments in polymer science and technology pertinent to microelectronics. Addresses such topics as photophysics and radiation physics and chemistry of polymers; photoresists, electron beam resists, and X-ray resists; insulating materials in microelectronics; photoresponsive materials; silicon-containing polymers; conducting polymers; and optoelectronic materials. Includes international contributions from both academia and industry.

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Contenuti

• K. Horie: Photophysics, Photochemistry, and Photo-optical Effects in Polymer Solids
• D. Creed, R. A. Coad, A.C. Griffin, C. E. Hoyle, L. Jin, P. Subramanian, S. V. Varma, and K. Venkataram: Photochemistry of Liquid-Crystalline Polymers
• P.H. Kasai: Dissociative Electron Capture of Polymers with Bridging Acid Anhydrides: Matrix Isolation Electron Spin Resonance Study
• Y.Aoki, H. Namba, F. Hosoi, and S. Nagai: Luminescence Study of Ion-Irradiated Aromatic Polymers
• E.Reichmanis, M.E. Galvin, K. E. Uhrich, P. Mirau, and S. A. Heffner: New Directions in the Design of Chemically Amplified Resist
• H.Ito and Y. Maekawa: Dual-Tone and Aqueous Base Developable Negative Resists Based on Acid-Catalyzed Dehydration
• N.P. Hacker: Importance of Donor-Acceptor Reactions for the Photogeneration of Acid in Chemically Amplified Resists
• T.Watanabe, Y. Yamashita, T. Kozawa, Y. Yoshida, and S. Tagawa: Acid Generation in Chemivcally Amplified Resist Films
• T. Kozawa, M. Uesaka, T. Watanabe, Y.Yamashita, H. Shibata, Y. Yoshida, and S. Tagawa: Radiation-Induced Reactions of Onium Salts in Novolak
• K. Maeda, K. Nakano, and E. Hasegawa: Polymeric Sulfonium Salts as Acid Generators for Excimer Laser Lithography
• I. Naito, A. Kinoshita, Y. Okamoto, and S. Takamuku: Application of Triaryl Phosphate to Photosensitive Materials: Photoreaction Mechanisms of Triaryl Phosphate
• J. Nakamura, H. Ban, Y. Kawai, and A. Tanaka: Effect of Water on the Surface Insoluble Layer of Chemical Amplified Positive Resists
• K. Asakawa, A. Hongu, N. Oyasato, and M. Nakase: Thermal Properties of a Chemically Amplified Resist Resin
• A. Hongu, K. Asakawa, T. Ushirogouchi, H. Wakabayashi, S. Saito, and M. Nakase: Modeling and Simulation of Chemically Amplified Resist Systems
• M. Shirai, T. Sumino, and M. Tsunooka: Surface Imaging Using Photoinduced Acid-Catalyzed Formation of Polysiloxanes at Air-Polymer Interface
• K.-H. Baik and L. Van den hove: Surface Imaging for Applications to Sub-0.35-µm Lithography
• M. Kaji: Molecular Design of Epoxy Resins for Microelectronics Packaging
• M. Hasegawa, T. Matano, Y. Shindo, and T. Sugimura: Uniaxial and In-Plane Molecular Orientation of Polymides and Their Precursor: Studied by Absorption Dichroism of Perylenebisimide Dye
• A. Mochizuki, T. Teraniishi, M. Ueda, and T. Omote: Novel Photosensitive Polyimide Precursor Based on Polyisoimide Using Nifedipine as A Dissolution Inhibitor
• T. Yamaoka, S. Yokoyama, T. Omote, K. Naitoh, and K. Yoshida: Photochemical Behavior of Nifedipine Derivatives and Application to Photosensitsive Polyimides
• C. Feger, S. Perutz, R. Reuter, J.E. McGrath, M. Osterfeld, and H. Franke: Waveguiding in High-Temperature-Stable Materials
• S. Ando, T. Sawada, Y. Inoue: Rodlike Fluorinated Polyimide as in In-Plane Birefringent Optical Material
• N.A. Johnen, H.K. Kim, and C. K. Ober: Preparation of Polyphenylene and Copolymer for Microelectronics Applications
• G.P. van der Laan, M.P. de Haas, J.M. Warman, D.M. de Leeuw, and J. Tsibouklis: Charge-Carrier Generation and Migration in a Polydiacetylene compound: Pulse Radiolysis, Time-Resolved Microwave Conductivity Study
• H.ßler, E.O. Gbel, A. Greiner, R. Kersting, H. Kurz, U. Lemmer, R.F. Mahrt, and Y. Wada: Excitation Dynamics in Conjugated Polymers
• Y. Oki, T. Suzuki, T. Miura, M. Numajiri, and K. Kondo: Application of Polyaniline Films to Radiation Dosimetry
• K. Tanigaki: Present and Future of Fullerenes: C[6[0 nd Tubules
• K. Anderle and J. H. Wendorff: Photoresponsive Liquid-Crystalline Polymers: Holographic Storage, Digital Storage, and Holographic Optical Components
• K. Ichimura: Azimuthal Alighment Photocontrol of Piquid Crystals
• H.S. Plitt, J.W. Downing, H. Teramae, M.K. Raymond, and J. Michl: Electronic Structure and UV Absorption Spectra of Permethylated Silicon Chains
• R. G. Kepler and Z.G Soos: Electronic Properties of Polysilanes
• K. Seki, A.Yuyama, S. Narioka, H. Ishii, S. Hasegawa, H. Isaka, M. Fujino, M. Fujiki, and N. Matsumoto: UV Photoelectron Spectroscopy of Polysilanes and Polygermanes
• A. Watanabe, M. Matsuda, Y. Yoshida, and S. Tagawa: Radical Ions of Polysilynes
• K. Suzuki, Y. Kanemitsu, S. Kyushin, and H. Matsumoto: Optical Properties of SIlicon-Based Polymers with Different Backbone Structures
• E. Fossum and K. Matyjaszewski: Synthesis and Properties of Polysilanes Prepared by Ring-Opening Polymerization
• A. Kameyama, N. Hayashi, and T. Nishikubo: New Synthesis and Functionalization of Photosensitive Poly(silylether) by Addition Reaction of Bisepoxide with Dichlorosilane

Product Description

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Dettagli dell'edizione

• Editore: American Chemical Society
• Data di pubblicazione: 1995
• Lingua: Inglese
• ISBN 10: 0841230552
• ISBN 13: 9780841230552
• Rilegatura: Copertina rigida
• Numero di pagine: 540
• Redattore: Ito Hiroshi, Tagawa Seiichi, Horie Kazuyuki
• Contatto del produttore: non disponibile
• Persona responsabile: non disponibile