Computational Modeling in Semiconductor Processing - Rilegato

Rilegato

ISBN 10: 0890067074 ISBN 13: 9780890067079

Casa editrice: Artech House, 1994

Riassunto

This text provides coverage of the models, governing equations and numerical techniques suitable for process simulation. It concentrates on such areas as chemical vapour deposition, metal-organic chemical vapour deposition, plasma processing, rapid thermal processing and crystal growth, as well as defining the basic principles of transport phenomena, gas phase and surface reactions in electronics materials processing. In addition, it explains how to apply practical numerical techniques used in process simulation, and presents the numerical methods necessary to produce simulation codes. The work is intended for those new to the field of process and equipment simulation in electronics materials processing, and also for the experienced modeller. It also contains coverage suitable for graduate students in materials science, and chemical, mechanical and electrical engineering.

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Dettagli dell?edizione

• Editore: Artech House
• Data di pubblicazione: 1994
• ISBN 10: 0890067074
• ISBN 13: 9780890067079
• Rilegatura: Copertina rigida
• Lingua: Inglese
• Numero di pagine: 363
• Redattore: Meyyappan M.