Ion Beam Surface Layer Analysis: Volume 2 - Brossura

Meyer, Otto

Brossura

ISBN 10: 1461588812 ISBN 13: 9781461588818

Casa editrice: Springer, 2012

Riassunto

The II. International Conference on Ion Beam Surface Layer Analysis was held on September 15-19, 1975 at the Nuclear Research Center, Karlsruhe, Germany. The date fell between two related con­ ferences: "Application of Ion-Beams to Materials" at Warwick, Eng­ land and "Atomic Collisions in Solids" at Amsterdam, the Nether­ lands. The first conference on Ion Beam Surface Layer Analysis was held at Yorktown Heights, New York, 1973. The major topic of that and the present conference was the material analysis with ion beams including backscattering and channeling, nuclear reactions and ion induced X-rays with emphasis on technical problems and no­ vel applications. The increasing interest in this field was docu­ mented by 7 invited papers and 85 contributions which were presen­ ted at the meeting in Karlsruhe to about 150 participants from 21 countries. The oral presentations were followed by parallel ses­ sions on "Fundamental Aspects", "Analytical Problems" and "Appli­ cations" encouraging detailed discussions on the topics of most current interest. Summaries of these sessions were presented by the discussion leaders to the whole conference. All invited and contributed papers are included in these proceedings; summaries of the discussion sessions will appear in a separate booklet and are availble from the editors. The application of ion beams to material analysis is now well established.

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Contenuti

of Volume 2.- V. Lattice Location and Dechanneling in Disordered Crystals.- Analysis Problems in Lattice Location Studies.- Multi-String Statistical Equilibrium Calculation of Scattering Yield for Foreign Atom Location Using Channeling Effect.- Ion Channeling Studies of the Lattice Location of Interstitial Impurities: Hydrogen in Metals.- Depth Distribution of Damage Obtained by Rutherford Backscattering Combined with Channeling.- Helium Trapping in Aluminum and Sintered Aluminum Powders.- Helium Re-Emission and Surface Deformation in Niobium During Multiple Temperature Helium Implantation.- Studies on Compound Thin Film Semiconductors by Ion Beam and Electron Microscopy Techniques.- Energy Dependence of Channeling Analysis in Implantation Damaged Al.- Characterization of Reordered (001) Au Surfaces by the Combined Techniques of Positive Ion Channeling Spectroscopy (PICS), LEED-AES, and Computer Simulation.- Proton Channeling Applied to the Study of Thermal Disorder in AgBr.- Neon-Ion Implantation Damage Gettering of Heavy Metal Impurities in Silicon.- VI. Related Techniques.- A New Scanning Ion Microscope for Surface and In-Depth Analysis.- Sputtering of Thin Films in an Ion Microprobe.- Xe+ Ion Beam Induced Secondary Ion (Si+) Yield from Si-Metal Interfaces.- Surface Analysis of Ion Bombarded Metal Foils by XPS.- Chemical Reaction Enhancement and Damage Rate of Surface Layer Bombarded with Inert Ion Beams.- VII. Ion Induced X-Ray Spectroscopy.- Progress in the Description of Ion Induced X-Ray Production; Theory and Implication for Analysis.- K-Shell Ionization of Boron Induced by Light Ions Bombardment.- Effect of Channeling on Impurity Analysis by Charged Particle Induced X-Rays.- Depth Profiling with Ion Induced X-Rays.- Sensitivity in Trace Element Analysis of Thick Samples Using Proton Induced X-Rays.- Review of Trace Analysis by Ion Induced X-Rays.- The Use of Proton Induced X-Rays to Monitor the Near Surface Composition of Catalysts.- Application of Proton-Induced X-Ray Emission to Elemental Analysis of Oligo-Elements in Human Lymphocytes.- Elemental Analysis of Biological Samples Using Deuteron Induced X-Rays and Charged Particles.- Suppression of Radioactive Background in Ion Induced X-Ray Analysis.- VIII. Nuclear Reactions.- Depth Profiling of Hydrogen and Helium Isotopes in Solids by Nuclear Reaction Analysis.- Achievable Depth Resolution in Profiling Light Atoms by Nuclear Reactions.- Depth Profiling of Deuterons in Metals at Large Implantation Depths Using the Nuclear Reaction Technique.- Gas Reemission and Blister Formation on Nickel Surfaces During High Energy Deuteron Bombardment.- Unfolding Techiques for the Determination of Distribution Profiles from Resonance Reaction Gamma-Ray Yields.- Z2 Dependence of the Electronic Stopping Power of 800 keV 14N+ Ions in Targets from Carbon Through Molybdenum.- Sensitivity of Fluorine Detection in Different Matrices and at Different Depths Through the 19F(p,??)16O Reaction.- Ion Beam Analysis Techniques in Corrosion Science.- Quantitative Measurement of Light Element Profiles in Thick Corrosion Films on Steels, Using the Harwell Nuclear Microbeam.- Nuclear Microprobe Analysis of Reactor Materials.- Analysis or Microgram Quantities of Aluminum in Germanium.- Analysis of Fluorine by Nuclear Reactions and Application to Human Dental Enamel.- Determination of Nitrogen Depth Distributions in Cereals Using the 14N(d,p0)15N Reaction.- Experimental Measurements, Mathematical Analysis and Partial Deconvolution of the Asymmetrical Response of Surface Barrier Detectors to MeV 4He, 12C, 14N, 16O Ions.- Experimental Study of the Stopping Power and Energy Straggling of MeV 4He, 12C, 14N, 16O Ions in Amorphous Aluminium Oxide.- Author Index.

Dettagli dell?edizione

• Editore: Springer
• Data di pubblicazione: 2012
• Lingua: Inglese
• ISBN 10: 1461588812
• ISBN 13: 9781461588818
• Rilegatura: Copertina flessibile
• Numero di pagine: 512
• Contatto del produttore: non disponibile
• Persona responsabile: CMN Printpool Inh. Mathis Neumann; https://www.also.com/ec/cms5/en_6000/6000/index.jsp; ; Friedrich-Karl-Str. 9; Hamburg; Germania