Afterall Spring/Summer 2019: Spring/Summer 2021, Issue 51: Volume 51 - Brossura

Brossura

ISBN 10: 1846382505 ISBN 13: 9781846382505

Casa editrice: Univ of Chicago Pr, 2021

Riassunto

Established in 1998, Afterall is a journal of contemporary art that provides in-depth analysis of art and its social, political, and philosophical contexts. Each issue provides the reader with well-researched contributions that discuss each artist&;s work from different perspectives. Contextual essays and other texts discussing events, works, or exhibitions further develop the thematic focus of each issue.
 

Su questo libro

Informazioni sull?autore

Charles Esche is the director of the Van Abbemuseum, Eindhoven and co-editorial director and co-founder of Afterall. Mark Lewis is an artist, Professor at University of the Arts London, and co-editorial director and co-founder of Afterall. Nav Haq is Senior Curator at MUHKA in Antwerp.  Amber Husain is a writer and managing editor of Afterall. Adeena Mey is a writer and researcher, and managing editor of Afterall. Charles Stankievech is an artist and Director of Visual Studies, Faculty of Architecture, University of Toronto.
 

Dettagli dell'edizione

• Editore: Univ of Chicago Pr
• Data di pubblicazione: 2021
• Lingua: Inglese
• ISBN 10: 1846382505
• ISBN 13: 9781846382505
• Rilegatura: Copertina flessibile
• Numero edizione: 1
• Numero di pagine: 175
• Redattore: Esche Charles, Lewis Mark, Haq Nav, Husain Amber, Mey Adeena
• Contatto del produttore: non disponibile
• Persona responsabile: non disponibile