Advanced Nano Deposition Methods - Rilegato

Rilegato

ISBN 10: 3527340254 ISBN 13: 9783527340255

Casa editrice: Blackwell Verlag GmbH, 2016

Riassunto

This concise reference summarizes the latest results in nano-structured thin films, the first to discuss both deposition methods and electronic applications in detail.
Following an introduction to this rapidly developing field, the authors present a variety of organic and inorganic materials along with new deposition techniques, and conclude with an overview of applications and considerations for their technology deployment.

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Informazioni sull?autore

Yuan Lin obtained her PhD in condensed materials from the University of Science and Technology in Hefei, China, in 1999. She continued as a research associate in the Institute of Physics at the Chinese Academic Science in Bejing, China, followed by the University of Houston and Los Alamos National Laboratory, USA, as well as a senior engineer at Intel Corp., USA.
Currently, she is a Yangtze River Scholar Chair Professor at the University of Electronic Science and Technology in Chengdu, China. She has worked in the field of thin film and nanomaterials for about 20 years. Her area of expertise includes advanced material research using pulsed laser deposition, rf-sputtering and chemical-solution deposition.
Dr. Lin has authored more than 90 scientific publications and 13 patents.

Dettagli dell'edizione

• Editore: Blackwell Verlag GmbH
• Data di pubblicazione: 2016
• Lingua: Inglese
• ISBN 10: 3527340254
• ISBN 13: 9783527340255
• Rilegatura: Copertina rigida
• Numero edizione: 1
• Numero di pagine: 328
• Redattore: Lin Yuan
• Contatto del produttore: Wiley-VCH GmbH; product_safety@wiley.com; ; Boschstrasse 12; Weinheim; 69469; Germania