Articoli correlati a Process Technology for Semiconductor Lasers: Crystal...

Process Technology for Semiconductor Lasers: Crystal Growth and Microprocesses: v. 30 - Rilegato

Iga, Kenichi; Kinoshita, Susumu

 
9783540589723: Process Technology for Semiconductor Lasers: Crystal Growth and Microprocesses: v. 30

Sinossi

This work describes the design principles of semiconductor lasers, mainly from the fabrication point of view. A review is given of the history of semiconductor-laser development and applications, and of the materials used in lasing at short to long wavelengths. The basic design principles for semiconductor-laser devices and the epitaxy for laser production are discussed. One chapter of the text is devoted to the technology of liquid-phase epitaxy, and another one to vapour-phase and beam epitaxies. The characterizations of laser materials and the fabrication and characteristics of semiconductor lasers are treated. Mode-control techniques are presented, and surface-emitting lasers are introduced in the final chapter.

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Dalla quarta di copertina

Process Technology for Semiconductor Lasers describes the design principles of semiconductor lasers, mainly from the fabrication point of view. Starting out with the history of semiconductor-laser development and applications the materials for use in lasing from short to long wavelengths are reviewed. The basic design principles for semiconductor- laser devices and the epitaxy for laser production are discussed. An entire chapter is devoted to the technology of liquid-phase epitaxy, and another one to vapor-phase and beam epitaxies, respectively. The characterizations of laser materials, and the fabrication and characteristics of semiconductor lasers are treated. Mode-control techniques are presented, and surface-emitting lasers are introduced in the final chapter.

Le informazioni nella sezione "Su questo libro" possono far riferimento a edizioni diverse di questo titolo.