Thin films of copper nitride received much attention because of their wide range of applications such as write-once optical recording, insulating barrier in magnetic tunnel junctions, generating microscopic copper lines by maskless laser writing or copper dots by maskless electron beam writing. The physical properties of the deposited films depend mainly on the deposition technique employed and the process parameters maintained during the growth of the films. This book restrains the optimized preparation condition of copper nitride films using dc reactive magnetron sputtering technique by precisely controlling the process parameters, and investigated the physical properties of the films. The promising approach to prepare the device quality copper nitride films for optical recording devices was discussed clearly in this book.
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Dr.K.Venkata Subba Reddy has carried out research work on metal nitride thin films for optical storage devices, and he obtained Ph.D. Degree in Physics from S.V.University in the year 2007 under the supervision of Prof. S. Uthanna. At present he is working as a reader in the Department of Physics, S.B.V.R. Degree College, Badvel, A.P. Inida.
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Condizione: New. Dieser Artikel ist ein Print on Demand Artikel und wird nach Ihrer Bestellung fuer Sie gedruckt. Autor/Autorin: Katherapalli Venkata Subba ReddyDr.K.Venkata Subba Reddy has carried out research work on metal nitride thin films for optical storage devices, and he obtained Ph.D. Degree in Physics from S.V.University in the year 2007 under the su. Codice articolo 159147311
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Da: BuchWeltWeit Ludwig Meier e.K., Bergisch Gladbach, Germania
Taschenbuch. Condizione: Neu. This item is printed on demand - it takes 3-4 days longer - Neuware -Thin films of copper nitride received much attention because of their wide range of applications such as write-once optical recording, insulating barrier in magnetic tunnel junctions, generating microscopic copper lines by maskless laser writing or copper dots by maskless electron beam writing. The physical properties of the deposited films depend mainly on the deposition technique employed and the process parameters maintained during the growth of the films. This book restrains the optimized preparation condition of copper nitride films using dc reactive magnetron sputtering technique by precisely controlling the process parameters, and investigated the physical properties of the films. The promising approach to prepare the device quality copper nitride films for optical recording devices was discussed clearly in this book. 132 pp. Englisch. Codice articolo 9783659901416
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Taschenbuch. Condizione: Neu. nach der Bestellung gedruckt Neuware - Printed after ordering - Thin films of copper nitride received much attention because of their wide range of applications such as write-once optical recording, insulating barrier in magnetic tunnel junctions, generating microscopic copper lines by maskless laser writing or copper dots by maskless electron beam writing. The physical properties of the deposited films depend mainly on the deposition technique employed and the process parameters maintained during the growth of the films. This book restrains the optimized preparation condition of copper nitride films using dc reactive magnetron sputtering technique by precisely controlling the process parameters, and investigated the physical properties of the films. The promising approach to prepare the device quality copper nitride films for optical recording devices was discussed clearly in this book. Codice articolo 9783659901416
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Taschenbuch. Condizione: Neu. Neuware -Thin films of copper nitride received much attention because of their wide range of applications such as write-once optical recording, insulating barrier in magnetic tunnel junctions, generating microscopic copper lines by maskless laser writing or copper dots by maskless electron beam writing. The physical properties of the deposited films depend mainly on the deposition technique employed and the process parameters maintained during the growth of the films. This book restrains the optimized preparation condition of copper nitride films using dc reactive magnetron sputtering technique by precisely controlling the process parameters, and investigated the physical properties of the films. The promising approach to prepare the device quality copper nitride films for optical recording devices was discussed clearly in this book.Books on Demand GmbH, Überseering 33, 22297 Hamburg 132 pp. Englisch. Codice articolo 9783659901416
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