High-k materials in Dynamic Random Access Memories (DRAM): Atomic scale engineering of HfO2-based dielectrics for future DRAM applications - Brossura

Dudek, Piotr

 
9783838130187: High-k materials in Dynamic Random Access Memories (DRAM): Atomic scale engineering of HfO2-based dielectrics for future DRAM applications
Brossura
ISBN 10: 3838130189 ISBN 13: 9783838130187
Casa editrice: Südwestdeutscher Verlag für Hochschulschriften, 2011

Sinossi

I would like to give you an outstanding opportunity to experience more about modern materials for Dynamic Random Access Memories. Therefore I give this book into your hands. You will find here a theory chapter focusing on DRAM physics as well as a deep description of deposition and characterization methods used in this work. Finally, you will discover how to engineer materials on an atomic scale and how to investigate those thin films.

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Informazioni sull?autore

Born 1983 in Bogatynia,Poland.1992-1999 primary school in Bogatynia,1999-2002 secondary school in Bogatynia,2002-2007 Faculty of Microsystems, Electronics, Photonics, Wroclaw University of Technology,2004-2009 Faculty of Foreign Languages, Wroclaw University,2007-2011 BTU Cottbus Germany, PhD in experimental Physics

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Editore
Südwestdeutscher Verlag für Hochschulschriften
Data di pubblicazione
2011
Lingua
Inglese
ISBN 10 
3838130189
ISBN 13 
9783838130187
Rilegatura
Copertina flessibile
Numero di pagine
112
Contatto del produttore
non disponibile
Persona responsabile
non disponibile