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Chemical Process Design and Simulation Based on Aspen Plus and Aspen HYSYS(Chinese Edition) - Brossura
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Language:Chinese.paperback.Pub Date:2025-01.publisher:National Defense Industry Press.description:Paperback. Pub Date: 2025-01 Pages: 484 Publisher: National Defense Industry Press This book introduces the methods of chemical process design and simulation using AspenPlus and AspenHYSYS simulation software. It explains the principles of chemical e
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Chemical Process Design and Simulation Based on Aspen Plus and Aspen HYSYS(Chinese Edition)
Editore:
National Defense Industry Press, 2025
ISBN 10: 7118131970
ISBN 13: 9787118131970
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paperback
Da: liu xing, Nanjing, JS, Cina
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paperback. Condizione: New. Language:Chinese.Paperback. Pub Date: 2025-01 Pages: 484 Publisher: National Defense Industry Press This book introduces the methods of chemical process design and simulation using AspenPlus and AspenHYSYS simulation software. It explains the principles of chemical engineering design and illustrates its application examples in the most commonly used simulation software. The book is divided into four parts: Introduction to Design and Simulation. Unit Operation Design and Simulation. and Conven. Codice articolo DT049592
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