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Integrated Circuit Process Experimental Foundation(Chinese Edition)
ISBN 10: 7566922130
ISBN 13: 9787566922137
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paperback
Da: liu xing, Nanjing, JS, Cina
Valutazione del venditore 5 su 5 stelle
paperback. Condizione: New. Language:Chinese.Paperback. Pub Date: 2023-06 Publisher: Donghua University Press The book is divided into 3 chapters. with a total of 26 experiments. Chapter 1 is the basic process. including vacuum technology. cleaning and oxidation of silicon wafers. experimental teaching of photolithography process flow. oxygen plasma etching. plasma enhanced chemical vapor deposition. magnetron sputtering to prepare metal films. and atomic layer deposition to prepare nanofilms. Experimental principles an. Codice articolo DR007853
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