Low Dimensional Structures Prepared by Epitaxial Growth or Regrowth on Patterned Substrates

Lingua: inglese

Editore: Springer Netherlands Aug 1995, 1995

0792336798 / 9780792336792

Da: BuchWeltWeit Ludwig Meier e.K., Bergisch Gladbach, GermaniaBuchWeltWeit Ludwig Meier e.K.

Venditore con 5 stelle

Venditore AbeBooks dal 11 gennaio 2012

Visualizza gli articoli di questo venditore
Rilegato

Condizione: Nuovo

EUR 213,99

EUR 23,00 spedizione 
Spedito da Germania a U.S.A.

Quantità: 2 disponibili

Aggiungi al carrello
Resi gratuiti per 30 giorni

Descrizione dell’articolo da parte del venditore

This item is printed on demand - it takes 3-4 days longer - Neuware -Significant experimental work is devoted to the preparation of one and zero dimensional semiconductor structures in view of future electronic and optical devices which involve quantum effects. The aim is good control in the realisation of nanometer structures both in vertical and lateral direction. Conventional processing techniques based on lithography face inherent problems such as limited resolution and surface defects caused by reactive ion etching. During the last few years several research groups started working on direct syntheses of semiconductor nanostructures by combining epitaxial growth techniques such as molecular beam epitaxy and chemical vapour deposition with pre patterning of the substrate wafers. Another idea is based on island formation in strained layer heteroepitaxy. Zero and one dimensional structures with dimensions down to a few atomic distances have been realised this way. An important point is that the size of the quantum structures is controlled within the epitaxial deposition in a self-adjusting process. The main subjects of the book are: Theoretical aspects of epitaxial growth, selfassembling nanostructures and cluster formation, epitaxial growth in tilted and non-(001) surfaces, cleaved edge overgrowth, nanostructure growth on patterned silicon substrates, nanostructures prepared by selective area epitaxy or growth on patterned substrates, in-situ etching and device applications based on epitaxial regrowth on patterned substrates. The experimental work mainly concentrated on GaAs/A1GaAs, GaAs/InGaAs, InGaP/InP and Si/SiGe based semiconductor heterostructures. Growth related problems received special attention. The different concepts for preparation of low dimensional structures are presented to allow direct comparison and to identify new concepts for future research work. 402 pp. Englisch.…

Codice articolo 9780792336792

Titolo
Low Dimensional Structures Prepared by Epitaxial Growth or Regrowth on Patterned Substrates
Autore
K. Eberl
Editore
Springer Netherlands Aug 1995
Anno di pubblicazione
1995
Condizione
Neu
Rilegatura
Buch
Lingua
inglese
ISBN 10
0792336798
ISBN 13
9780792336792
Peso dell'articolo
767 grammi
Dimensioni
241x160x27 mm

BuchWeltWeit Ludwig Meier e.K.

Bergisch Gladbach, Germania

Venditore con 5 stelle

Venditore AbeBooks dal 11 gennaio 2012

Tariffe di spedizione da Germania a U.S.A.

ArticoloDa 5 a 15 giorni lavorativiDa 5 a 15 giorni lavorativi
Primo articoloEUR 23,00EUR 23,00
I tempi di consegna sono stabiliti dai venditori e variano in base al corriere e al paese. Gli ordini che devono attraversare una dogana possono subire ritardi e spetta agli acquirenti pagare eventuali tariffe o dazi associati. I venditori possono contattarti in merito ad addebiti aggiuntivi dovuti a eventuali maggiorazioni dei costi di spedizione dei tuoi articoli.

Metodi di pagamento

  • Visa
  • Mastercard
  • American Express
  • Carte Bleue
  • Apple Pay
  • Google Pay
  • Assegno
  • Bonifico bancario
  • PayPal

Informazioni sull’azienda del venditore

BuchWeltWeit Ludwig Meier e.K.

Germania