Machine Learning-Based Modelling in Atomic Layer Deposition Processes

Lingua: inglese

Editore: Taylor and Francis Ltd, GB, 2025

1032386738 / 9781032386737

Da: Rarewaves.com UK, London, Regno UnitoRarewaves.com UK

Venditore con 5 stelle

Venditore AbeBooks dal 11 giugno 2025

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Descrizione dell’articolo da parte del venditore

While thin film technology has benefited greatly from artificial intelligence (AI) and machine learning (ML) techniques, there is still much to be learned from a full-scale exploration of these technologies in atomic layer deposition (ALD). This book provides in-depth information regarding the application of ML-based modeling techniques in thin film technology as a standalone approach and integrated with the classical simulation and modeling methods. It is the first of its kind to present detailed information regarding approaches in ML-based modeling, optimization, and prediction of the behaviors and characteristics of ALD for improved process quality control and discovery of new materials. As such, this book fills significant knowledge gaps in the existing resources as it provides extensive information on ML and its applications in film thin technology.Offers an in-depth overview of the fundamentals of thin film technology, state-of-the-art computational simulation approaches in ALD, ML techniques, algorithms, applications, and challenges.Establishes the need for and significance of ML applications in ALD while introducing integration approaches for ML techniques with computation simulation approaches.Explores the application of key techniques in ML, such as predictive analysis, classification techniques, feature engineering, image processing capability, and microstructural analysis of deep learning algorithms and generative model benefits in ALD.Helps readers gain a holistic understanding of the exciting applications of ML-based solutions to ALD problems and apply them to real-world issues.Aimed at materials scientists and engineers, this book fills significant knowledge gaps in existing resources as it provides extensive information on ML and its applications in film thin technology. It also opens space for future intensive research and intriguing opportunities for ML-enhanced ALD processes, which scale from academic to industrial applications. …

Codice articolo LU-9781032386737

Titolo
Machine Learning-Based Modelling in Atomic Layer Deposition Processes
Autore
Oluwatobi Adeleke, Sina Karimzadeh, Tien-Chien Jen
Editore
Taylor and Francis Ltd, GB
Anno di pubblicazione
2025
Condizione
New
Rilegatura
Paperback
Lingua
inglese
ISBN 10
1032386738
ISBN 13
9781032386737
Peso dell'articolo
740 grammi

Rarewaves.com UK

London, Regno Unito

Venditore con 5 stelle

Venditore AbeBooks dal 11 giugno 2025

Tariffe di spedizione da Regno Unito a U.S.A.

ArticoloDa 60 a 60 giorni lavorativiDa 60 a 60 giorni lavorativi
Primo articoloEUR 78,00EUR 120,00
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