Nano-plating (III): Database of Plated Film Microstructures completes the trilogy of nanoplating books written by Tohru Watanabe. Nanoplating (I) covers microstructure formation theory of plated films, with Nanoplating (II) covering a metallurgical approach to electrochemical theory and its applications to technology. This third installment shows the relationship between composition and microstructure of 27 pure metals and 55 alloy plating films, including electrodeposition and electroless plating and provides a database of plated film microstructures. The book presents readers with an efficient reference work that helps optimize their syntheses in order to obtain specific deposit types.

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For many years, Tohru Watanabe worked in the Department of Applied Chemistry at Tokyo Metropolitan University. He is currently engaged in electrochemical engineering and technical consulting at the Watanabe Nano-Plating Laboratory. He organized the Nano plating Study Group and held 134 study sessions in 33 years and continues to do so. He is the author of Nano-Plating, published by Elsevier in 2004, and published many articles and several conference papers in international scientific journals, as well as several Japanese books.

Tohru Watanabe graduated from Shibaura Institute of Technology. After researching on mechanical materials in the Department of Mechanical Engineering at Tokyo Metropolitan University, he moved to the Department of Industrial Chemistry and started research on plating from there. In 1976 be obtained a doctoral degree in Engineering from Tokyo Metropolitan University. Then he was a visiting researcher at University of Sussex in the UK, a visiting professor at Beijing Institute of Technology, a lecturer at Shibaura Institute of Technology, and Chuo University, and a researcher at the Tokyo Metropolitan Industrial Research Center.

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