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Surveys the role of plasma physics and chemistry in various fields of technology, such as lamps, the treatment of materials, plasma sources for microwave excitation, and the plasma destruction of pollutants. Among the topics are basic concepts, nonequilibrium modelling, diagnostics, and laser interaction with solid targets. The 14 papers are from a workshop at Il Ciocco, Italy, July 1991. Annotation copyright Book News, Inc. Portland, Or.
Contenuti: Plasmas in Nature, Laboratory, and Technology (A. Ignatov, A.A. Rukhadze). Laser Diagnostics of Plasmas (L. Pyatnitsky). Probe Diagnostics of Plasmas (G. Dilecce). Theory, Properties, and Applications of Nonequilibrium Plasmas Created by External Energy Sources (E.E. Son). Nonequilibrium Plasma Modeling (M. Capitelli et al.). Gas Discharge Lamps (M. Koedam). Plasma Etching Processes and Diagnostics (R. d'Agostino, F. Fracassi). Plasma Deposition (A. Koch). Correlations between Active Plasma Species and Steel Surface Nitriding in Microwave Postdischarge Reactors (A. Ricard et al.). Simultaneous Removal of NOx SOx and Soot in Diesel Engine Exhaust by Plasma/Oil Dynamics Means (K. Fujii). DeNOx DeSOx Process by Gas Energization (L. Civitano, E. Sani). Microwave Excitation Technology (P. Leprince, J. Marec). Negative Ion Source Technology (H.J. Hopman, R.M.A. Heeren). Quasistationary Optical Discharges on Solid Targets (V.B. Fedorov). Index.
Titolo: PLASMA TECHNOLOGY FUNDAMENTALS AND ...
Casa editrice: SPRINGER
Data di pubblicazione: 1992
Legatura: Rilegato
Condizione: New Books
Edizione: Edizione Internazionale