Plasma Etching : Fundamentals and Applications

M. Sugawara

ISBN 10: 019856287X / ISBN 13: 9780198562870

Editore: Oxford University Press Jul 1998, 1998

Riguardo questo articolo

Neuware - This book focuses on the remarkable recent advances in understanding low pressure radio frequency glow discharges. It explains the basic analytical theory, plasma physics, and plasma diagnostics, before proceeding to the details of the etching process.

Codice articolo 9780198562870

Dati bibliografici

• Titolo: Plasma Etching : Fundamentals and Applications
• Editore: Oxford University Press Jul 1998
• Data di pubblicazione: 1998
• Lingua: Inglese
• ISBN 10: 019856287X
• ISBN 13: 9780198562870
• Rilegatura: Buch
• Condizione: Neu

Descrizione articolo

Riassunto

The focus of this book is the remarkable advances in understanding of low pressure RF (radio frequency) glow discharges. A basic analytical theory and plasma physics are explained. Plasma diagnostics are also covered before the practicalities of etcher use are explored.

Informazioni sull?autore

Professor Minoru Sugawara, Hachinohe Institute of Technology, Hachinohe-city, Aomori 031, Japan. Fax: (0) 178 25 1430