RECENT DEVELOPMENTS IN OXIDE AND METAL EPITAXY Â " THEORY AND EXPERIMENT

MARK YEADON, NATIONAL UNIVERSITY OF SINGAPORESHIRLEY CHIANG, UNIVERSITY OF CALIFORNIA, DAVISROBIN F. C. FARROW, IBM ALMADEN RESEARCH CENTER, NEW YORKJAMES W. EVANS, IOWA STATE UNIVERSITYORLANDO AUCIELLO, ARGONNE NATIONAL LABORATORY, ILLINOIS

ISBN 10: 1558995277 / ISBN 13: 9781558995277

Editore: Cambridge University Press, 2000

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Codice articolo ABEOCT25-170555

Dati bibliografici

• Titolo: RECENT DEVELOPMENTS IN OXIDE AND METAL EPITAXY Â " THEORY AND EXPERIMENT
• Editore: Cambridge University Press
• Data di pubblicazione: 2000
• Lingua: Inglese
• ISBN 10: 1558995277
• ISBN 13: 9781558995277
• Rilegatura: Rilegato
• Condizione: Brand New

Descrizione articolo

Riassunto

The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners.

Descrizione del libro

Thin-film epitaxy is integral to many current and emerging technologies, and continued progress in solving critical issues is essential to the realization of new devices. This book, first published in 2000, focuses on progress in solving fundamental issues in the epitaxial growth of metals and oxides.