Treatise on Clean Surface Technology

Lingua: inglese

Editore: Springer US, Springer US Apr 2012, 2012

1468491288 / 9781468491289

Da: BuchWeltWeit Ludwig Meier e.K., Bergisch Gladbach, GermaniaBuchWeltWeit Ludwig Meier e.K.

Venditore con 5 stelle

Venditore AbeBooks dal 11 gennaio 2012

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This item is printed on demand - it takes 3-4 days longer - Neuware -1. UV/Ozone Cleaning of Surfaces.- 1. Introduction.- 2. The Variables of UV/Ozone Cleaning.- 2.1. The Wavelengths Emitted by the UV Sources.- 2.2. Distance between the Sample and the UV Source.- 2.3. The Contaminants.- 2.4. The Precleaning.- 2.5. The Substrate.- 2.6. Rate Enhancement Techniques.- 3. The Mechanism of UV/Ozone Cleaning.- 4. UV/Ozone Cleaning in Vacuum Systems.- 5. Safety Considerations.- 6. UV/Ozone Cleaning Facility Construction.- 7. Applications.- 8. Effects Other Than Cleaning.- 8.1. Oxidation.- 8.2. UV-Enhanced Outgassing.- 8.3. Other Surface/Interface Effects.- 8.4. Etching.- 9. Summary and Conclusions.- References and Notes.- 2. Techniques for Cleaning Liquid Surfaces.- 1. Introduction.- 2. The Origin of Dynamic Liquid Surface Phenomena.- 3. The Notion of Surface Cleanliness.- 4. The History of Clean Surfaces.- 5. The Nature of Surface Contamination.- 6. Cleaning Techniques.- 6.1. Primary Distillation.- 6.2. Further Distillation.- 6.3. Bubble Cleaning.- 6.4. Surface Skimming and Talc Cleaning.- 6.5. Solid Adsorption Techniques.- 6.6. Laser Burning.- 6.7. Solution Preparation.- 6.8. Surface Cleaning in Engineering Applications.- 7. Materials for Clean-Surface Experiments.- 7.1. Principles.- 7.2. Construction of Apparatus.- 7.3. Water Storage Materials.- 8. Cleaning of Apparatus.- 8.1. ¿Hard¿ Materials¿Chromic Acid.- 8.2. Perspex¿Detergents.- 9. General Design Considerations.- 10. Summary.- References.- 3. Hydroson Cleaning of Surfaces.- 1. Introduction.- 2. The Hydroson System.- 3. Experimental Investigation of Mechanisms in the Tank.- 4. Commercial Applications of Hydroson Cleaning.- 5. Safety and Economy.- 6. Recent Developments.- 6.1. Wire Cleaning.- 6.2. Coil Strip Cleaning.- 6.3. Barrel Cleaning and Rinsing.- 6.4. Cleaning Molds in the Glass Industry.- 6.5. Nuclear Industry.- 6.6. Phosphating.- 6.7. Electrodeposition.- 7. Size and Cost of Equipment.- 8. Comparison with Ultrasonic and Megasonic Cleaning.- 9. Conclusion.- References.- 4. Methods of Measurement of Ionic Surface Contamination.- 1. Introduction.- 2. Ionic Measurement.- 3. Static Extraction Methods.- 3.1. Egan¿s Method.- 3.2. Method of Hobson and DeNoon.- 3.3. Omega Meter.- 3.4. Ion Chaser.- 3.5. Contaminometer.- 4. Dynamic Extraction Method-Ionograph.- 5. Applications of Ionic Contamination Measurements.- 6. Future Prospects.- 7. Summary.- References.- 5. Characterization of Surface Contaminants by Luminescence Using Ultraviolet Excitation.- 1. Introduction.- 2. The Luminescence Technique for Surface Detection.- 3. Applications.- 3.1. The Use of UV ¿Black Light¿ for Surface Detection.- 3.2. Study of Workers¿ Skin Contamination by the ¿Skin-Wash¿ Method.- 3.3. The Fiberoptic Luminoscope for Monitoring Occupational Skin Contamination.- 3.4. Detection of Surface Contamination with the Spill Spotter.- 3.5. Remote Sensing with Laser-Based Fluorosensors.- 3.6. A Fluorescent Tracer Detection Technique.- 3.7. Studies of Absorption of Carcinogenic Materials into Mouse Skin.- 3.8. Chromogenic and Fluorogenic Spot Test Techniques.- 3.9. Sensitized Fluorescence Spot Tests.- 3.10. Surface Detection by Room Temperature Phosphorimetry.- 4. Conclusion.- References.- 6. Particulate Surface Contamination and Device Failures.- 1. Introduction.- 2. Sources of Particulate Contamination.- 2.1. Air.- 2.2. Chemicals.- 2.3. Gases.- 2.4. Wafer Handling.- 3. Effects on Device Performance.- 3.1. Particulate Contamination on Photomasks.- 3.2. Epitaxial Growth.- 3.3. Failure Mechanism in MOS Gate Oxides.- 3.4. Impurity Contamination in Silicon.- 4. Summary.- References.- 7. Effect of Surface Contamination on the Performance of HVDC Insulators.- 1. Introduction.- 2. General Overview of the Flashover Process.- 3. Deposition of Particles.- 3.1. Introduction.- 3.2. The Electrical Environment.- 3.3. Charging Mechanisms.- 3.4. Particle Deposition Rates.- 4. Deposition of Moisture.- 5. Thermal Processes.- 6.…

Codice articolo 9781468491289

Titolo
Treatise on Clean Surface Technology
Autore
K. L. Mittal
Editore
Springer US, Springer US Apr 2012
Anno di pubblicazione
2012
Condizione
Neu
Rilegatura
Taschenbuch
Lingua
inglese
ISBN 10
1468491288
ISBN 13
9781468491289
Peso dell'articolo
510 grammi
Dimensioni
229x152x20 mm

BuchWeltWeit Ludwig Meier e.K.

Bergisch Gladbach, Germania

Venditore con 5 stelle

Venditore AbeBooks dal 11 gennaio 2012

Tariffe di spedizione da Germania a U.S.A.

ArticoloDa 5 a 15 giorni lavorativiDa 5 a 15 giorni lavorativi
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