X-Ray Diffraction at Elevated Temperatures: A Method for In Situ Process Analysis

Chung, Deborah D; Detlaven, Patrick W; Arnold, H; Ghosh, Debastis

ISBN 10: 3527278427 / ISBN 13: 9783527278428

Editore: Wiley-VCH, 1993

Zustand: Sehr gut | Seiten: 268 | Sprache: Deutsch | Produktart: Bücher | Keine Beschreibung verfügbar. Codice articolo 42297414/202

Riassunto:

This monograph provides detailed information on the principles, instrumentation, and application of X-ray diffraction at elevated temperatures. More particularly, it summarizes the uses of intense X-ray sources and position-sensitive detectors to assess them in comparison with competing techniques for in situ process analysis at elevated temperatures. This book is intended for use in the training of personnel and in the promotion of the process. Within the areas of X-ray diffraction, materials characterization and thermal analysis, it should be of interest to crystallographers, thermal analysts, materials scientists, physicists, chemists, chemical engineers, and electrical engineers.

Dati bibliografici

Titolo: X-Ray Diffraction at Elevated Temperatures: ...
Casa editrice: Wiley-VCH
Data di pubblicazione: 1993
Legatura: Rilegato
Condizione: Sehr gut