Lingua: Inglese
Editore: New York / London. Plenum Press., 1980
ISBN 10: 0306402998 ISBN 13: 9780306402999
Da: Antiquariat Löwenstein, Göllersdorf, NÖ, Austria
EUR 22,00
Quantità: 1 disponibili
Aggiungi al carrellopp. VIII. 520. Cloth. In good condition. Unfortunately, deliveries to the USA are not possible at this time.
Editore: plenum press NY 1980, 1980
Da: Antiquariat Thomas & Reinhard, Recklinghausen, NRW, Germania
EUR 18,00
Quantità: 1 disponibili
Aggiungi al carrelloLeinen, 520 Seiten, dies ist ein regulär ausgesondertes Bibliotheksexemplar aus einer wissenschaftlichen Bibliothek, keine Markierungen/Anmerkungen, Einbandränder aufgehellt, das Buch ist gut erhalten --- Linen, Lib. Ex., 520 pages, no marks, cover margins brightened, the book is in a good condition. Shipping to abroad insured with tracking number.
Da: Ria Christie Collections, Uxbridge, Regno Unito
EUR 59,54
Quantità: Più di 20 disponibili
Aggiungi al carrelloCondizione: New. In.
Da: Chiron Media, Wallingford, Regno Unito
EUR 56,73
Quantità: 10 disponibili
Aggiungi al carrelloPF. Condizione: New.
Da: Books Puddle, New York, NY, U.S.A.
Condizione: New. pp. 536.
Da: preigu, Osnabrück, Germania
EUR 50,25
Quantità: 5 disponibili
Aggiungi al carrelloTaschenbuch. Condizione: Neu. Site Characterization and Aggregation of Implanted Atoms in Materials | R. Coussement (u. a.) | Taschenbuch | 520 S. | Englisch | 2012 | Springer US | EAN 9781468410174 | Verantwortliche Person für die EU: Springer Verlag GmbH, Tiergartenstr. 17, 69121 Heidelberg, juergen[dot]hartmann[at]springer[dot]com | Anbieter: preigu.
Da: AHA-BUCH GmbH, Einbeck, Germania
EUR 59,97
Quantità: 1 disponibili
Aggiungi al carrelloTaschenbuch. Condizione: Neu. Druck auf Anfrage Neuware - Printed after ordering - Explosive developments in microelectronics, interest in nuclear metallurgy, and widespread applications in surface science have all produced many advances in the field of ion implantation. The research activity has become so intensive and so broad that the field has become divided into many specialized subfields. An Advanced Study Institute, covering the basic and common phenomena of aggregation, seems opportune for initiating interested scientists and engineers into these various active subfields since aggregation usually follows ion implantation. As a consequence, Drs. Perez, Coussement, Marest, Cachard and I submitted such a pro posal to the Scientific Affairs Division of NATO, the approval of which resulted in the present volume. For the physicist studying nuclear hyperfine interactions, the consequences of aggregation of implanted atoms, even at low doses, need to be taken into account if the results are to be correctly interpreted. For materials scientists and device engineers, under standing aggregation mechanisms and methods of control is clearly essential in the tailoring of the end products.
Lingua: Inglese
Editore: Plenum New York, 1980
Da: ralfs-buecherkiste, Herzfelde, MOL, Germania
EUR 22,00
Quantità: 1 disponibili
Aggiungi al carrelloCloth. Condizione: Wie neu. 520 S. Ion implantation Congress Guter Zustand/ Good Ex-Library. With numerous ill.and figures. Cover faded at the edges and shows mild wear. ha1069803 Sprache: Englisch Gewicht in Gramm: 1060.
Da: Brook Bookstore On Demand, Napoli, NA, Italia
EUR 46,22
Quantità: Più di 20 disponibili
Aggiungi al carrelloCondizione: new. Questo è un articolo print on demand.
Lingua: Inglese
Editore: Springer US, Chapman And Hall/CRC Mär 2012, 2012
ISBN 10: 1468410172 ISBN 13: 9781468410174
Da: BuchWeltWeit Ludwig Meier e.K., Bergisch Gladbach, Germania
EUR 53,49
Quantità: 2 disponibili
Aggiungi al carrelloTaschenbuch. Condizione: Neu. This item is printed on demand - it takes 3-4 days longer - Neuware -Explosive developments in microelectronics, interest in nuclear metallurgy, and widespread applications in surface science have all produced many advances in the field of ion implantation. The research activity has become so intensive and so broad that the field has become divided into many specialized subfields. An Advanced Study Institute, covering the basic and common phenomena of aggregation, seems opportune for initiating interested scientists and engineers into these various active subfields since aggregation usually follows ion implantation. As a consequence, Drs. Perez, Coussement, Marest, Cachard and I submitted such a pro posal to the Scientific Affairs Division of NATO, the approval of which resulted in the present volume. For the physicist studying nuclear hyperfine interactions, the consequences of aggregation of implanted atoms, even at low doses, need to be taken into account if the results are to be correctly interpreted. For materials scientists and device engineers, under standing aggregation mechanisms and methods of control is clearly essential in the tailoring of the end products. 536 pp. Englisch.
Da: Biblios, Frankfurt am main, HESSE, Germania
EUR 74,44
Quantità: 4 disponibili
Aggiungi al carrelloCondizione: New. PRINT ON DEMAND pp. 536.
Da: Majestic Books, Hounslow, Regno Unito
EUR 80,81
Quantità: 4 disponibili
Aggiungi al carrelloCondizione: New. Print on Demand pp. 536 67:B&W 6.69 x 9.61 in or 244 x 170 mm (Pinched Crown) Perfect Bound on White w/Gloss Lam.
Lingua: Inglese
Editore: Springer-Verlag New York Inc., 2012
ISBN 10: 1468410172 ISBN 13: 9781468410174
Da: THE SAINT BOOKSTORE, Southport, Regno Unito
EUR 70,88
Quantità: Più di 20 disponibili
Aggiungi al carrelloPaperback / softback. Condizione: New. This item is printed on demand. New copy - Usually dispatched within 5-9 working days.
Da: moluna, Greven, Germania
EUR 48,37
Quantità: Più di 20 disponibili
Aggiungi al carrelloCondizione: New. Dieser Artikel ist ein Print on Demand Artikel und wird nach Ihrer Bestellung fuer Sie gedruckt. Explosive developments in microelectronics, interest in nuclear metallurgy, and widespread applications in surface science have all produced many advances in the field of ion implantation. The research activity has become so intensive and so broad that the .
Lingua: Inglese
Editore: Springer US, Chapman And Hall/CRC Mär 2012, 2012
ISBN 10: 1468410172 ISBN 13: 9781468410174
Da: buchversandmimpf2000, Emtmannsberg, BAYE, Germania
EUR 53,49
Quantità: 1 disponibili
Aggiungi al carrelloTaschenbuch. Condizione: Neu. This item is printed on demand - Print on Demand Titel. Neuware -Explosive developments in microelectronics, interest in nuclear metallurgy, and widespread applications in surface science have all produced many advances in the field of ion implantation. The research activity has become so intensive and so broad that the field has become divided into many specialized subfields. An Advanced Study Institute, covering the basic and common phenomena of aggregation, seems opportune for initiating interested scientists and engineers into these various active subfields since aggregation usually follows ion implantation. As a consequence, Drs. Perez, Coussement, Marest, Cachard and I submitted such a pro posal to the Scientific Affairs Division of NATO, the approval of which resulted in the present volume. For the physicist studying nuclear hyperfine interactions, the consequences of aggregation of implanted atoms, even at low doses, need to be taken into account if the results are to be correctly interpreted. For materials scientists and device engineers, under standing aggregation mechanisms and methods of control is clearly essential in the tailoring of the end products.Springer-Verlag GmbH, Tiergartenstr. 17, 69121 Heidelberg 536 pp. Englisch.