Isbn: 9780471103110 - ion implantation (3 risultati)

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  • Lingua: Inglese

    Editore: John Wiley and Sons Ltd, 1986

    047110311X / 9780471103110

    • Rilegato

    Da: World of Books (was SecondSale), Montgomery, IL, U.S.A.World of Books (was SecondSale)

    Venditore con 5 stelle
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    Condizione: Usato - Buono

    EUR 69,41

     Spedizione gratuita 
    Spedito in U.S.A.

    Quantità: 1 disponibile

    Hardback. Condizione: Good. In contrast to the majority of books on ion implantation, which are directed at specialists, this book is written for industrial and research engineers who use ion implantation as a tool to dope semiconductors and change material properties. Therefore, the authors stress the practical problems involved rather than the theoretical background, covering such topics as defects, thermal annealing, laser annealing and apparatus. The main emphasis of the book is on techniques. After a short description of the theoretical background, the authors concentrate on the various practical matters arising during the use of ion implantation, such as the electrical activation of implanted ions and diffusion effects. Standard measurement methods and requirements for accelerators are discussed and many examples of the uses of ion implantation are given.…

  • Lingua: Inglese

    Editore: John Wiley and Sons Ltd, 1986

    047110311X / 9780471103110

    • Rilegato

    Da: World of Books Inc, Montgomery, IL, U.S.A.World of Books Inc

    Venditore con 4 stelle
    Contatta il venditore

    Condizione: Usato - Buono

    EUR 72,88

     Spedizione gratuita 
    Spedito in U.S.A.

    Quantità: 1 disponibile

    Hardback. Condizione: Good. In contrast to the majority of books on ion implantation, which are directed at specialists, this book is written for industrial and research engineers who use ion implantation as a tool to dope semiconductors and change material properties. Therefore, the authors stress the practical problems involved rather than the theoretical background, covering such topics as defects, thermal annealing, laser annealing and apparatus. The main emphasis of the book is on techniques. After a short description of the theoretical background, the authors concentrate on the various practical matters arising during the use of ion implantation, such as the electrical activation of implanted ions and diffusion effects. Standard measurement methods and requirements for accelerators are discussed and many examples of the uses of ion implantation are given.…

  • Lingua: Inglese

    Editore: John Wiley and Sons, 1986

    047110311X / 9780471103110

    • Rilegato

    Da: Anybook.com, Lincoln, Regno UnitoAnybook.com

    Venditore con 5 stelle
    Contatta il venditore

    Condizione: Usato - Buono

    EUR 59,86

    EUR 15,41 spedizione 
    Spedito da Regno Unito a U.S.A.

    Quantità: 1 disponibile

    Condizione: Good. This is an ex-library book and may have the usual library/used-book markings inside.This book has hardback covers. In good all round condition. No dust jacket. Please note the Image in this listing is a stock photo and may not match the covers of the actual item,950grams, ISBN:047110311X. …