Isbn: 9780792382720 - cmos vlsi engineering: silicon-on-insulator (soi) (20 risultati)

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  • Lingua: Inglese

    Editore: Springer, 1998

    0792382722 / 9780792382720

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    hardcover. Condizione: Hardcover. Hardcover. modest shelf-wear. Free of any markings and no writings inside.

  • Lingua: Inglese

    Editore: Kluwer Academic Publishers, Boston, 1998

    0792382722 / 9780792382720

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    Da: PsychoBabel & Skoob Books, Didcot, Regno UnitoPsychoBabel & Skoob Books

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    hardcover. Condizione: Very Good. No Dust Jacket. Name from previous owner on FEP. Binding is very well preserved, though with minor instances of light surface wear, and a small dent on middle of spine (that does not impact function or cause tearing). Pages are clean and crisp, and printing is tight, clean and bright throughout. No dust jacket. MB. Used.…

  • Lingua: Inglese

    Editore: Springer, 1998

    0792382722 / 9780792382720

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    Da: Librairie Parrêsia, Figeac, FranciaLibrairie Parrêsia

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    Hardcover Sep 30, 1998. Condizione: Used: Very Good. Cmos Vlsi Engineering: Silicon-On-Insulator (Soi) | Kuo/Ker-Wei Su | Kluwer Academic Publishers, 1998, in-8 cartonnage éditeur, 422 pages. Couverture propre. Dos solide. Intérieur frais. Exemplaire de bibliothèque : petit code barre en pied de 1re de couv., cotation au dos, rares et discrets petits tampons à l'intérieur de l'ouvrage. Bel état ! [BT15+].…

  • Lingua: Inglese

    Editore: Springer US, 1998

    0792382722 / 9780792382720

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    Da: Buchpark, Trebbin, GermaniaBuchpark

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    Condizione: Gut. Zustand: Gut | Seiten: 468 | Sprache: Englisch | Produktart: Bücher | Silicon-On-Insulator (SOI) CMOS technology has been regarded as another major technology for VLSI in addition to bulk CMOS technology. Owing to the buried oxide structure, SOI technology offers superior CMOS devices with higher speed, high density, and reduced second order effects for deep-submicron low-voltage, low-power VLSI circuits applications. In addition to VLSI applications, and because of its outstanding properties, SOI technology has been used to realize communication circuits, microwave devices, BICMOS devices, and even fiber optics applications. CMOS VLSI Engineering: Silicon-On-Insulator addresses three key factors in engineering SOI CMOS VLSI - processing technology, device modelling, and circuit designs are all covered with their mutual interactions. Starting from the SOI CMOS processing technology and the SOI CMOS digital and analog circuits, behaviors of the SOI CMOS devices are presented, followed by a CAD program, ST-SPICE, which incorporates models for deep-submicron fully-depleted mesa-isolated SOI CMOS devices and special purpose SOI devices including polysilicon TFTs. CMOS VLSI Engineering: Silicon-On-Insulator is written for undergraduate senior students and first-year graduate students interested in CMOS VLSI. It will also be suitable for electrical engineering professionals interested in microelectronics.…

  • Lingua: Inglese

    Editore: Springer, 1998

    0792382722 / 9780792382720

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    Da: GreatBookPricesUK, Woodford Green, Regno UnitoGreatBookPricesUK

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  • Lingua: Inglese

    Editore: Springer, 1998

    0792382722 / 9780792382720

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  • Lingua: Inglese

    Editore: Springer, 1998

    0792382722 / 9780792382720

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    Da: Ria Christie Collections, Uxbridge, Regno UnitoRia Christie Collections

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    Condizione: New. In English.

  • Lingua: Inglese

    Editore: Kluwer Academic Publishers, 1998

    0792382722 / 9780792382720

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    Da: Kennys Bookshop and Art Galleries Ltd., Galway, GY, IrlandaKennys Bookshop and Art Galleries Ltd.

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    EUR 204,43

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    Condizione: New. Silicon-On-Insulator (SOI) CMOS technology has been regarded as another major technology for VLSI in addition to bulk CMOS technology. This book addresses three key factors in engineering SOI CMOS VLSI - processing technology, device modelling, and circuit designs are all covered with their mutual interactions. Num Pages: 422 pages, biography. BIC Classification: TJFC; UY. Category: (P) Professional & Vocational. Dimension: 235 x 155 x 25. Weight in Grams: 829. . 1998. Hardback. . . . .…

  • Lingua: Inglese

    Editore: Springer, 1998

    0792382722 / 9780792382720

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    Condizione: New. pp. 468.

  • Lingua: Inglese

    Editore: Kluwer Academic Publishers, 1998

    0792382722 / 9780792382720

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    Condizione: New. Silicon-On-Insulator (SOI) CMOS technology has been regarded as another major technology for VLSI in addition to bulk CMOS technology. This book addresses three key factors in engineering SOI CMOS VLSI - processing technology, device modelling, and circuit designs are all covered with their mutual interactions. Num Pages: 422 pages, biography. BIC Classification: TJFC; UY. Category: (P) Professional & Vocational. Dimension: 235 x 155 x 25. Weight in Grams: 829. . 1998. Hardback. . . . . Books ship from the US and Ireland.…

  • Lingua: Inglese

    Editore: Springer, 1998

    0792382722 / 9780792382720

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    Da: GreatBookPricesUK, Woodford Green, Regno UnitoGreatBookPricesUK

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    Condizione: Usato - Come nuovo

    EUR 256,19

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    Condizione: As New. Unread book in perfect condition.

  • Lingua: Inglese

    Editore: Springer, 1998

    0792382722 / 9780792382720

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    Da: Mispah books, Redhill, SURRE, Regno UnitoMispah books

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    Hardcover. Condizione: Like New. LIKE NEW. SHIPS FROM MULTIPLE LOCATIONS. book.

  • Lingua: Inglese

    Editore: Springer, 1998

    0792382722 / 9780792382720

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  • Lingua: Inglese

    Editore: Springer US Sep 1998, 1998

    0792382722 / 9780792382720

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    Da: BuchWeltWeit Ludwig Meier e.K., Bergisch Gladbach, GermaniaBuchWeltWeit Ludwig Meier e.K.

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    Buch. Condizione: Neu. This item is printed on demand - it takes 3-4 days longer - Neuware -Silicon-On-Insulator (SOI) CMOS technology has been regarded as another major technology for VLSI in addition to bulk CMOS technology. Owing to the buried oxide structure, SOI technology offers superior CMOS devices with higher speed, high density, and reduced second order effects for deep-submicron low-voltage, low-power VLSI circuits applications. In addition to VLSI applications, and because of its outstanding properties, SOI technology has been used to realize communication circuits, microwave devices, BICMOS devices, and even fiber optics applications. CMOS VLSI Engineering: Silicon-On-Insulator addresses three key factors in engineering SOI CMOS VLSI - processing technology, device modelling, and circuit designs are all covered with their mutual interactions. Starting from the SOI CMOS processing technology and the SOI CMOS digital and analog circuits, behaviors of the SOI CMOS devices are presented, followed by a CAD program, ST-SPICE, which incorporates models for deep-submicron fully-depleted mesa-isolated SOI CMOS devices and special purpose SOI devices including polysilicon TFTs. CMOS VLSI Engineering: Silicon-On-Insulator is written for undergraduate senior students and first-year graduate students interested in CMOS VLSI. It will also be suitable for electrical engineering professionals interested in microelectronics. 468 pp. Englisch.…

  • Lingua: Inglese

    Editore: Springer US, 1998

    0792382722 / 9780792382720

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    Da: moluna, Greven, Germaniamoluna

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    Gebunden. Condizione: New. Dieser Artikel ist ein Print on Demand Artikel und wird nach Ihrer Bestellung fuer Sie gedruckt. Silicon-On-Insulator (SOI) CMOS technology has been regarded as another major technology for VLSI in addition to bulk CMOS technology. Owing to the buried oxide structure, SOI technology offers superior CMOS devices with higher speed, high density, and r.…

  • Lingua: Inglese

    Editore: Humana, 1998

    0792382722 / 9780792382720

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    Da: AHA-BUCH GmbH, Einbeck, GermaniaAHA-BUCH GmbH

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    Buch. Condizione: Neu. nach der Bestellung gedruckt Neuware - Printed after ordering - Silicon-On-Insulator (SOI) CMOS technology has been regarded as another major technology for VLSI in addition to bulk CMOS technology. Owing to the buried oxide structure, SOI technology offers superior CMOS devices with higher speed, high density, and reduced second order effects for deep-submicron low-voltage, low-power VLSI circuits applications. In addition to VLSI applications, and because of its outstanding properties, SOI technology has been used to realize communication circuits, microwave devices, BICMOS devices, and even fiber optics applications. CMOS VLSI Engineering: Silicon-On-Insulator addresses three key factors in engineering SOI CMOS VLSI - processing technology, device modelling, and circuit designs are all covered with their mutual interactions. Starting from the SOI CMOS processing technology and the SOI CMOS digital and analog circuits, behaviors of the SOI CMOS devices are presented, followed by a CAD program, ST-SPICE, which incorporates models for deep-submicron fully-depleted mesa-isolated SOI CMOS devices and special purpose SOI devices including polysilicon TFTs. CMOS VLSI Engineering: Silicon-On-Insulator is written for undergraduate senior students and first-year graduate students interested in CMOS VLSI. It will also be suitable for electrical engineering professionals interested in microelectronics.…

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    Lingua: Inglese

    Editore: Springer US, 1998

    0792382722 / 9780792382720

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    Da: preigu, Osnabrück, Germaniapreigu

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    Buch. Condizione: Neu. CMOS VLSI Engineering | Silicon-on-Insulator (SOI) | Ker-Wei Su (u. a.) | Buch | xxxvi | Englisch | 1998 | Springer US | EAN 9780792382720 | Verantwortliche Person für die EU: Springer Verlag GmbH, Tiergartenstr. 17, 69121 Heidelberg, juergen[dot]hartmann[at]springer[dot]com | Anbieter: preigu Print on Demand.…

  • Lingua: Inglese

    Editore: Springer US, Springer US Sep 1998, 1998

    0792382722 / 9780792382720

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    Da: buchversandmimpf2000, Emtmannsberg, BAYE, Germaniabuchversandmimpf2000

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    Buch. Condizione: Neu. This item is printed on demand - Print on Demand Titel. Neuware -Silicon-On-Insulator (SOI) CMOS technology has been regarded as another major technology for VLSI in addition to bulk CMOS technology. Owing to the buried oxide structure, SOI technology offers superior CMOS devices with higher speed, high density, and reduced second order effects for deep-submicron low-voltage, low-power VLSI circuits applications. In addition to VLSI applications, and because of its outstanding properties, SOI technology has been used to realize communication circuits, microwave devices, BICMOS devices, and even fiber optics applications.CMOS VLSI Engineering: Silicon-On-Insulator addresses three key factors in engineering SOI CMOS VLSI - processing technology, device modelling, and circuit designs are all covered with their mutual interactions. Starting from the SOI CMOS processing technology and the SOI CMOS digital and analog circuits, behaviors of the SOI CMOS devices are presented, followed by a CAD program, ST-SPICE, which incorporates models for deep-submicron fully-depleted mesa-isolated SOI CMOS devices and special purpose SOI devices including polysilicon TFTs.CMOS VLSI Engineering: Silicon-On-Insulator is written for undergraduate senior students and first-year graduate students interested in CMOS VLSI. It will also be suitable for electrical engineering professionals interested in microelectronics.Libri GmbH, Europaallee 1, 36244 Bad Hersfeld 468 pp. Englisch.…

  • Lingua: Inglese

    Editore: Springer, 1998

    0792382722 / 9780792382720

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    Da: Majestic Books, Hounslow, Regno UnitoMajestic Books

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    Condizione: New. Print on Demand pp. 468 52:B&W 6.14 x 9.21in or 234 x 156mm (Royal 8vo) Case Laminate on White w/Gloss Lam.

  • Lingua: Inglese

    Editore: Springer, 1998

    0792382722 / 9780792382720

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    Da: Biblios, frankfurt am main, HESSE, GermaniaBiblios

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    EUR 244,78

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    Condizione: New. PRINT ON DEMAND pp. 468.