9781138034150 - plasma electronics: applications in microelectronic device fabrication di makabe, toshiaki; petrovic, zoran lj. (14 risultati)

Lingua: Inglese
Editore: CRC Press, 2016
Serie: Series in Plasma Physics, Libro 5 di 16. Libro 5 di 16 - Series in Plasma Physics
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Lingua: Inglese
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Lingua: Inglese
Editore: CRC Press, 2016
Serie: Series in Plasma Physics, Libro 5 di 16. Libro 5 di 16 - Series in Plasma Physics
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Serie: Series in Plasma Physics, Libro 5 di 16. Libro 5 di 16 - Series in Plasma Physics
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Editore: Taylor & Francis Group, 2016
Serie: Series in Plasma Physics, Libro 5 di 16. Libro 5 di 16 - Series in Plasma Physics
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Lingua: Inglese
Editore: CRC Press, 2016
Serie: Series in Plasma Physics, Libro 5 di 16. Libro 5 di 16 - Series in Plasma Physics
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Taschenbuch. Condizione: Neu. Plasma Electronics | Applications in Microelectronic Device Fabrication | Toshiaki Makabe (u. a.) | Taschenbuch | Einband - flex.(Paperback) | Englisch | 2016 | CRC Press | EAN 9781138034150 | Verantwortliche Person für die EU: Libri GmbH, Europaallee 1, 36244 Bad Hersfeld, gpsr[at]libri[dot]de | An…bieter: preigu.

Lingua: Inglese
Editore: Routledge, 2016
Serie: Series in Plasma Physics, Libro 5 di 16. Libro 5 di 16 - Series in Plasma Physics
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Paperback. Condizione: Brand New. 2nd revised edition. 412 pages. 9.25x6.14x0.90 inches. In Stock.

Lingua: Inglese
Editore: CRC Press Okt 2016, 2016
Serie: Series in Plasma Physics, Libro 5 di 16. Libro 5 di 16 - Series in Plasma Physics
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- Print on Demand
Da: BuchWeltWeit Ludwig Meier e.K., Bergisch Gladbach, GermaniaBuchWeltWeit Ludwig Meier e.K.
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Taschenbuch. Condizione: Neu. This item is printed on demand - it takes 3-4 days longer - Neuware -Beyond enabling new capabilities, plasma-based techniques, characterized by quantum radicals of feed gases, hold the potential to enhance and improve many processes and applications. Following in the tradition of its popular predec…essor, Plasma Electronics, Second Edition: Applications in Microelectronic Device Fabrication explains the fundamental physics and numerical methods required to bring these technologies from the laboratory to the factory. Emphasizing computational algorithms and techniques, this updated edition of a popular monograph supplies a complete and up-to-date picture of plasma physics, computational methods, applications, and processing techniques. Reflecting the growing importance of computer-aided approaches to plasma analysis and synthesis, it showcases recent advances in fabrication from micro- and nano-electronics, MEMS/NEMS, and the biological sciences. A helpful resource for anyone learning about collisional plasma structure, function, and applications, this edition reflects the latest progress in the quantitative understanding of non-equilibrium low-temperature plasma, surface processing, and predictive modeling of the plasma and the process. Filled with new figures, tables, problems, and exercises, it includes a new chapter on the development of atmospheric-pressure plasma, in particular microcell plasma, with a discussion of its practical application to improve surface efficiency.The book provides an up-to-date discussion of MEMS fabrication and phase transition between capacitive and inductive modes in an inductively coupled plasma. In addition to new sections on the phase transition between the capacitive and inductive modes in an ICP and MOS-transistor and MEMS fabrications, the book presents a new discussion of heat transfer and heating of the media and the reactor. Integrating physics, numerical methods, and practical applications, this book equips you with the up-to-date understanding required to scale up lab breakthroughs into industrial innovations. 414 pp. Englisch.

Lingua: Inglese
Editore: CRC Press, 2016
Serie: Series in Plasma Physics, Libro 5 di 16. Libro 5 di 16 - Series in Plasma Physics
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- Print on Demand
Da: moluna, Greven, Germaniamoluna
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Kartoniert / Broschiert. Condizione: New. Dieser Artikel ist ein Print on Demand Artikel und wird nach Ihrer Bestellung fuer Sie gedruckt. Toshiaki Makabe received his BSc, MSc, and Ph.D. degrees in electrical engineering all from Keio University. He became a Professor of Electronics and Electrical Engineering in the Faculty of…Science and Technology at Keio University in 1.

Lingua: Inglese
Editore: CRC Press, 2016
Serie: Series in Plasma Physics, Libro 5 di 16. Libro 5 di 16 - Series in Plasma Physics
- Brossura
- Print on Demand
Da: AHA-BUCH GmbH, Einbeck, GermaniaAHA-BUCH GmbH
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Taschenbuch. Condizione: Neu. nach der Bestellung gedruckt Neuware - Printed after ordering - Beyond enabling new capabilities, plasma-based techniques, characterized by quantum radicals of feed gases, hold the potential to enhance and improve many processes and applications. Following in the tradition of its popular predecessor…, Plasma Electronics, Second Edition: Applications in Microelectronic Device Fabrication explains the fundamental physics and numerical methods required to bring these technologies from the laboratory to the factory. Emphasizing computational algorithms and techniques, this updated edition of a popular monograph supplies a complete and up-to-date picture of plasma physics, computational methods, applications, and processing techniques. Reflecting the growing importance of computer-aided approaches to plasma analysis and synthesis, it showcases recent advances in fabrication from micro- and nano-electronics, MEMS/NEMS, and the biological sciences. A helpful resource for anyone learning about collisional plasma structure, function, and applications, this edition reflects the latest progress in the quantitative understanding of non-equilibrium low-temperature plasma, surface processing, and predictive modeling of the plasma and the process. Filled with new figures, tables, problems, and exercises, it includes a new chapter on the development of atmospheric-pressure plasma, in particular microcell plasma, with a discussion of its practical application to improve surface efficiency.The book provides an up-to-date discussion of MEMS fabrication and phase transition between capacitive and inductive modes in an inductively coupled plasma. In addition to new sections on the phase transition between the capacitive and inductive modes in an ICP and MOS-transistor and MEMS fabrications, the book presents a new discussion of heat transfer and heating of the media and the reactor. Integrating physics, numerical methods, and practical applications, this book equips you with the up-to-date understanding required to scale up lab breakthroughs into industrial innovations.