9781441925800 - evolution of thin film morphology: modeling and simulations: 108 di pelliccione, matthew (13 risultati)
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Condizione: New. pp. 220.
Lingua: Inglese
Editore: Springer New York, Springer US, 2010
Serie: Libro 16 di 233 - Springer Series in Materials Science
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Taschenbuch. Condizione: Neu. Druck auf Anfrage Neuware - Printed after ordering - Thin lmdepositionisthemostubiquitousandcriticaloftheprocessesusedto manufacture high-tech devices such as microprocessors, memories, solar cells, microelectromechanicalsystems(MEMS),lasers,solid-statelighting,andp- tovoltaics. The morphology and m…icrostructure of thin lms directly controls their optical, magnetic, and electrical properties, which are often signi cantly di erent from bulk material properties. Precise control of morphology and microstructure during thin lm growth is paramount to producing the - sired lm quality for speci c applications. To date, many thin lm deposition techniques have been employed for manufacturing lms, including thermal evaporation,sputterdeposition,chemicalvapordeposition,laserablation,and electrochemical deposition. The growth of lms using these techniques often occurs under highly n- equilibrium conditions (sometimes referred to as far-from-equilibrium), which leads to a rough surface morphology and a complex temporal evolution. As atoms are deposited on a surface, atoms do not arrive at the surface at the same time uniformly across the surface. This random uctuation, or noise, which is inherent to the deposition process, may create surface growth front roughness. The noise competes with surface smoothing processes, such as surface di usion, to form a rough morphology if the experiment is performed at a su ciently low temperature and / or at a high growth rate. In addition, growth front roughness can also be enhanced by growth processes such as geometrical shadowing. Due to the nature of the deposition process, atoms approaching the surface do not always approach in parallel; very often atoms arrive at the surface with an angular distribution.
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Condizione: new. Questo è un articolo print on demand.
Lingua: Inglese
Editore: Springer New York Nov 2010, 2010
Serie: Libro 16 di 233 - Springer Series in Materials Science
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Taschenbuch. Condizione: Neu. This item is printed on demand - it takes 3-4 days longer - Neuware -The focus of this book is on modeling and simulations used in research on the morphological evolution during film growth. The authors emphasize the detailed mathematical formulation of the problem. The book will enable readers them…selves to set up a computational program to investigate specific topics of interest in thin film deposition. It will benefit those working in any discipline that requires an understanding of thin film growth processes. 220 pp. Englisch.
Lingua: Inglese
Editore: Springer New York, 2010
Serie: Libro 16 di 233 - Springer Series in Materials Science
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Condizione: New. Dieser Artikel ist ein Print on Demand Artikel und wird nach Ihrer Bestellung fuer Sie gedruckt. Presents basic modeling and simulation tools for quantitative description of thin film morphological evolutionDisplays clear conceptual developments in the fundamental understanding of complex surface growth phenomen…aProvides a close connec.
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Taschenbuch. Condizione: Neu. Evolution of Thin Film Morphology | Modeling and Simulations | Matthew Pelliccione (u. a.) | Taschenbuch | Springer Series in Materials Science | xi | Englisch | 2010 | Springer | EAN 9781441925800 | Verantwortliche Person für die EU: Springer Verlag GmbH, Tiergartenstr. 17, 69121 Heidelberg, juerge…n[dot]hartmann[at]springer[dot]com | Anbieter: preigu Print on Demand.
Lingua: Inglese
Editore: Springer New York, Springer US Nov 2010, 2010
Serie: Libro 16 di 233 - Springer Series in Materials Science
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Taschenbuch. Condizione: Neu. This item is printed on demand - Print on Demand Titel. Neuware -Thin lmdepositionisthemostubiquitousandcriticaloftheprocessesusedto manufacture high-tech devices such as microprocessors, memories, solar cells, microelectromechanicalsystems(MEMS),lasers,solid-statelighting,andp- tovoltaics. The morp…hology and microstructure of thin lms directly controls their optical, magnetic, and electrical properties, which are often signi cantly di erent from bulk material properties. Precise control of morphology and microstructure during thin lm growth is paramount to producing the - sired lm quality for speci c applications. To date, many thin lm deposition techniques have been employed for manufacturing lms, including thermal evaporation,sputterdeposition,chemicalvapordeposition,laserablation,and electrochemical deposition. The growth of lms using these techniques often occurs under highly n- equilibrium conditions (sometimes referred to as far-from-equilibrium), which leads to a rough surface morphology and a complex temporal evolution. As atoms are deposited on a surface, atoms do not arrive at the surface at the same time uniformly across the surface. This random uctuation, or noise, which is inherent to the deposition process, may create surface growth front roughness. The noise competes with surface smoothing processes, such as surface di usion, to form a rough morphology if the experiment is performed at a su ciently low temperature and / or at a high growth rate. In addition, growth front roughness can also be enhanced by growth processes such as geometrical shadowing. Due to the nature of the deposition process, atoms approaching the surface do not always approach in parallel; very often atoms arrive at the surface with an angular distribution.Springer Verlag GmbH, Tiergartenstr. 17, 69121 Heidelberg 220 pp. Englisch.
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Condizione: New. Print on Demand pp. 220 49:B&W 6.14 x 9.21 in or 234 x 156 mm (Royal 8vo) Perfect Bound on White w/Gloss Lam.
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Condizione: New. PRINT ON DEMAND pp. 220.
