Isbn: 9781441938442 - interconnect noise optimization in nanometer technologies (13 risultati)

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Paperback. Condizione: Brand New. 137 pages. 9.25x6.25x0.37 inches. In Stock.

Taschenbuch. Condizione: Neu. Interconnect Noise Optimization in Nanometer Technologies | Mohamed Elgamel (u. a.) | Taschenbuch | xix | Englisch | 2010 | Springer | EAN 9781441938442 | Verantwortliche Person für die EU: Springer Verlag GmbH, Tiergartenstr. 17, 69121 Heidelberg, juergen[dot]hartmann[at]springer[dot]com | Anbieter: preigu. …

Taschenbuch. Condizione: Neu. Druck auf Anfrage Neuware - Printed after ordering - Interconnect has become the dominating factor in determining system performance in nanometer technologies. Dedicated to this subject, Interconnect Noise Optimization in Nanometer Technologies provides insight and intuition into layout analysis and optimization for interconnect in high speed, high complexity integrated circuits.The authors bring together a wealth of information presenting a range of CAD algorithms and techniques for synthesizing and optimizing interconnect. Practical aspects of the algorithms and the models are explained with sufficient details. The book investigates the most effective parameters in layout optimization. Different post-layout optimization techniques with complexity analysis and benchmarks tests are provided. The impact crosstalk noise and coupling on the wire delay is analyzed. Parameters that affect signal integrity are also considered.…

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Taschenbuch. Condizione: Neu. This item is printed on demand - it takes 3-4 days longer - Neuware -Presents a range of CAD algorithms and techniques for synthesizing and optimizing interconnectProvides insight & intuition into layout analysis and optimization for interconnect in high speed, high complexity integrated circuits 160 pp. Englisch.…

Condizione: New. Dieser Artikel ist ein Print on Demand Artikel und wird nach Ihrer Bestellung fuer Sie gedruckt. Presents a range of CAD algorithms and techniques for synthesizing and optimizing interconnectProvides insight and intuition into layout analysis and optimization for interconnect in high speed, high complexity integrated circuitsPresen.…

Condizione: New. Print on Demand pp. 160 49:B&W 6.14 x 9.21 in or 234 x 156 mm (Royal 8vo) Perfect Bound on White w/Gloss Lam.

Condizione: New. PRINT ON DEMAND pp. 160.

Taschenbuch. Condizione: Neu. This item is printed on demand - Print on Demand Titel. Neuware -Interconnect has become the dominating factor in determining system performance in nanometer technologies. Dedicated to this subject, Interconnect Noise Optimization in Nanometer Technologies provides insight and intuition into layout analysis and optimization for interconnect in high speed, high complexity integrated circuits.The authors bring together a wealth of information presenting a range of CAD algorithms and techniques for synthesizing and optimizing interconnect. Practical aspects of the algorithms and the models are explained with sufficient details. The book investigates the most effective parameters in layout optimization. Different post-layout optimization techniques with complexity analysis and benchmarks tests are provided. The impact crosstalk noise and coupling on the wire delay is analyzed. Parameters that affect signal integrity are also considered.Springer-Verlag GmbH, Tiergartenstr. 17, 69121 Heidelberg 160 pp. Englisch.…