Isbn: 9781461366676 - advances in x-ray analysis (11 risultati)

PF. Condizione: New.

Condizione: New. In English.

Condizione: New. pp. 768 Index.

Paperback. Condizione: Brand New. reprint edition. 764 pages. 10.00x7.01x1.53 inches. In Stock.

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Taschenbuch. Condizione: Neu. Druck auf Anfrage Neuware - Printed after ordering - The 39th Annual Denver X-Ray Conference on Applications of X-Ray Analysis was held July 30 -August 3, 1990, at the Sheraton Steamboat Resort and Conference Center, Steamboat Springs, Colorado. The 'Denver Conference' is recognized to be a major event in the x-ray analysis field, bringing together scientists and engineers from around the world to discuss the state of the art in x-ray applications as well as indications for future develop ments. In recent years there has been a steady expansion of applications of x-ray analysis to characterize surfaces and thin films. To introduce the audience to one of the exciting and important new developments in x-ray fluorescence, the topic for the Plenary Session of the 1990 Conference was: 'Surface and Near-Surface X-Ray Spectroscopy. ' The Conference had the privilege of inviting five leading world experts in the field of x-ray spectroscopy to deliver lectures at the Plenary Session. The first two lectures were on total-reflection x-ray fluorescence spectrometry. Professor P. Wobrauschek of Austria reviewed 'Recent Developments and Results in Total-Reflection X-Ray Fluorescence. ' Trends and applications of the technique were also discussed. Dr. T. Arai of Japan reported on 'Surface and Near-Surface Analysis of Silicon Wafers by Total Reflection X-Ray Fluorescence. ' He emphasized the importance of using proper x-ray optics to achieve high signal-to-noise ratios. A mathematical model relating the x-ray intensity to the depth of x-ray penetration was also described. …

Taschenbuch. Condizione: Neu. This item is printed on demand - it takes 3-4 days longer - Neuware -The 39th Annual Denver X-Ray Conference on Applications of X-Ray Analysis was held July 30 -August 3, 1990, at the Sheraton Steamboat Resort and Conference Center, Steamboat Springs, Colorado. The 'Denver Conference' is recognized to be a major event in the x-ray analysis field, bringing together scientists and engineers from around the world to discuss the state of the art in x-ray applications as well as indications for future develop ments. In recent years there has been a steady expansion of applications of x-ray analysis to characterize surfaces and thin films. To introduce the audience to one of the exciting and important new developments in x-ray fluorescence, the topic for the Plenary Session of the 1990 Conference was: 'Surface and Near-Surface X-Ray Spectroscopy. ' The Conference had the privilege of inviting five leading world experts in the field of x-ray spectroscopy to deliver lectures at the Plenary Session. The first two lectures were on total-reflection x-ray fluorescence spectrometry. Professor P. Wobrauschek of Austria reviewed 'Recent Developments and Results in Total-Reflection X-Ray Fluorescence. ' Trends and applications of the technique were also discussed. Dr. T. Arai of Japan reported on 'Surface and Near-Surface Analysis of Silicon Wafers by Total Reflection X-Ray Fluorescence. ' He emphasized the importance of using proper x-ray optics to achieve high signal-to-noise ratios. A mathematical model relating the x-ray intensity to the depth of x-ray penetration was also described. 768 pp. Englisch.…

Condizione: New. Print on Demand pp. 768.

Condizione: New. PRINT ON DEMAND pp. 768.

Taschenbuch. Condizione: Neu. This item is printed on demand - Print on Demand Titel. Neuware -The 39th Annual Denver X-Ray Conference on Applications of X-Ray Analysis was held July 30 -August 3, 1990, at the Sheraton Steamboat Resort and Conference Center, Steamboat Springs, Colorado. The 'Denver Conference' is recognized to be a major event in the x-ray analysis field, bringing together scientists and engineers from around the world to discuss the state of the art in x-ray applications as well as indications for future develop ments. In recent years there has been a steady expansion of applications of x-ray analysis to characterize surfaces and thin films. To introduce the audience to one of the exciting and important new developments in x-ray fluorescence, the topic for the Plenary Session of the 1990 Conference was: 'Surface and Near-Surface X-Ray Spectroscopy. ' The Conference had the privilege of inviting five leading world experts in the field of x-ray spectroscopy to deliver lectures at the Plenary Session. The first two lectures were on total-reflection x-ray fluorescence spectrometry. Professor P. Wobrauschek of Austria reviewed 'Recent Developments and Results in Total-Reflection X-Ray Fluorescence. ' Trends and applications of the technique were also discussed. Dr. T. Arai of Japan reported on 'Surface and Near-Surface Analysis of Silicon Wafers by Total Reflection X-Ray Fluorescence. ' He emphasized the importance of using proper x-ray optics to achieve high signal-to-noise ratios. A mathematical model relating the x-ray intensity to the depth of x-ray penetration was also described.Springer Verlag GmbH, Tiergartenstr. 17, 69121 Heidelberg 768 pp. Englisch.…

Taschenbuch. Condizione: Neu. Advances in X-Ray Analysis | C. S. Barrett (u. a.) | Taschenbuch | xxi | Englisch | 2013 | Springer | EAN 9781461366676 | Verantwortliche Person für die EU: Springer Verlag GmbH, Tiergartenstr. 17, 69121 Heidelberg, juergen[dot]hartmann[at]springer[dot]com | Anbieter: preigu Print on Demand. …