Isbn: 9781461375517 - polycrystalline silicon for integrated circuits and displays (10 risultati)

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    • Lingua: Inglese

      Editore: Springer, 2012

      1461375517 / 9781461375517

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      Da: Ria Christie Collections, Uxbridge, Regno UnitoRia Christie Collections

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      Condizione: New. In English.

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      Lingua: Inglese

      Editore: Humana, 2012

      1461375517 / 9781461375517

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      Taschenbuch. Condizione: Neu. Polycrystalline Silicon for Integrated Circuits and Displays | Ted Kamins | Taschenbuch | xv | Englisch | 2012 | Humana | EAN 9781461375517 | Verantwortliche Person für die EU: Springer Verlag GmbH, Tiergartenstr. 17, 69121 Heidelberg, juergen[dot]hartmann[at]springer[dot]com | Anbieter: preigu.

    • Lingua: Inglese

      Editore: Springer, 2012

      1461375517 / 9781461375517

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      Da: Books Puddle, New York, NY, U.S.A.Books Puddle

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      Condizione: New. pp. 402.

    • Lingua: Inglese

      Editore: Springer, Humana, 2012

      1461375517 / 9781461375517

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      Da: AHA-BUCH GmbH, Einbeck, GermaniaAHA-BUCH GmbH

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      Taschenbuch. Condizione: Neu. Druck auf Anfrage Neuware - Printed after ordering - Polycrystalline Silicon for Integrated Circuits and Displays, Second Edition presents much of the available knowledge about polysilicon. It represents an effort to interrelate the deposition, properties, and applications of polysilicon. By properly understanding the properties of polycrystalline silicon and their relation to the deposition conditions, polysilicon can be designed to ensure optimum device and integrated-circuit performance. Polycrystalline silicon has played an important role in integrated-circuit technology for two decades. It was first used in self-aligned, silicon-gate, MOS ICs to reduce capacitance and improve circuit speed. In addition to this dominant use, polysilicon is now also included in virtually all modern bipolar ICs, where it improves the basic physics of device operation. The compatibility of polycrystalline silicon with subsequent high-temperature processing allows its efficient integration into advanced IC processes. This compatibility also permits polysilicon to be used early in the fabrication process for trench isolation and dynamic random-access-memory (DRAM) storage capacitors. In addition to its integrated-circuit applications, polysilicon is becoming vital as the active layer in the channel of thin-film transistors in place of amorphous silicon. When polysilicon thin-film transistors are used in advanced active-matrix displays, the peripheral circuitry can be integrated into the same substrate as the pixel transistors. Recently, polysilicon has been used in the emerging field of microelectromechanical systems (MEMS), especially for microsensors and microactuators. In these devices, the mechanical properties, especially the stress in the polysilicon film, are critical to successful device fabrication. Polycrystalline Silicon for Integrated Circuits and Displays, Second Edition is an invaluable reference for professionals and technicians workingwith polycrystalline silicon in the integrated circuit and display industries.

    • Lingua: Inglese

      Editore: Springer, 2012

      1461375517 / 9781461375517

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      Da: Brook Bookstore On Demand, Napoli, NA, ItaliaBrook Bookstore On Demand

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      EUR 190,30

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      Condizione: new. Questo è un articolo print on demand.

    • Lingua: Inglese

      Editore: Springer US Okt 2012, 2012

      1461375517 / 9781461375517

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      Da: BuchWeltWeit Ludwig Meier e.K., Bergisch Gladbach, GermaniaBuchWeltWeit Ludwig Meier e.K.

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      Taschenbuch. Condizione: Neu. This item is printed on demand - it takes 3-4 days longer - Neuware -Polycrystalline Silicon for Integrated Circuits and Displays, Second Edition presents much of the available knowledge about polysilicon. It represents an effort to interrelate the deposition, properties, and applications of polysilicon. By properly understanding the properties of polycrystalline silicon and their relation to the deposition conditions, polysilicon can be designed to ensure optimum device and integrated-circuit performance. Polycrystalline silicon has played an important role in integrated-circuit technology for two decades. It was first used in self-aligned, silicon-gate, MOS ICs to reduce capacitance and improve circuit speed. In addition to this dominant use, polysilicon is now also included in virtually all modern bipolar ICs, where it improves the basic physics of device operation. The compatibility of polycrystalline silicon with subsequent high-temperature processing allows its efficient integration into advanced IC processes. This compatibility also permits polysilicon to be used early in the fabrication process for trench isolation and dynamic random-access-memory (DRAM) storage capacitors. In addition to its integrated-circuit applications, polysilicon is becoming vital as the active layer in the channel of thin-film transistors in place of amorphous silicon. When polysilicon thin-film transistors are used in advanced active-matrix displays, the peripheral circuitry can be integrated into the same substrate as the pixel transistors. Recently, polysilicon has been used in the emerging field of microelectromechanical systems (MEMS), especially for microsensors and microactuators. In these devices, the mechanical properties, especially the stress in the polysilicon film, are critical to successful device fabrication. Polycrystalline Silicon for Integrated Circuits and Displays, Second Edition is an invaluable reference for professionals and technicians working with polycrystalline silicon in the integrated circuit and display industries. 400 pp. Englisch.

    • Lingua: Inglese

      Editore: Springer US, 2012

      1461375517 / 9781461375517

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      Da: moluna, Greven, Germaniamoluna

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      EUR 206,40

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      Condizione: New. Dieser Artikel ist ein Print on Demand Artikel und wird nach Ihrer Bestellung fuer Sie gedruckt. Polycrystalline Silicon for Integrated Circuits and Displays, Second Edition presents much of the available knowledge about polysilicon. It represents an effort to interrelate the deposition, properties, and applications of polysilicon.

    • Lingua: Inglese

      Editore: Springer, 2012

      1461375517 / 9781461375517

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      Da: Majestic Books, Hounslow, Regno UnitoMajestic Books

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      EUR 304,94

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      Condizione: New. Print on Demand pp. 402 49:B&W 6.14 x 9.21 in or 234 x 156 mm (Royal 8vo) Perfect Bound on White w/Gloss Lam.

    • Lingua: Inglese

      Editore: Springer, Humana Okt 2012, 2012

      1461375517 / 9781461375517

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      Da: buchversandmimpf2000, Emtmannsberg, BAYE, Germaniabuchversandmimpf2000

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      EUR 246,09

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      Taschenbuch. Condizione: Neu. This item is printed on demand - Print on Demand Titel. Neuware -Polycrystalline Silicon for Integrated Circuits and Displays, Second Edition presents much of the available knowledge about polysilicon. It represents an effort to interrelate the deposition, properties, and applications of polysilicon. By properly understanding the properties of polycrystalline silicon and their relation to the deposition conditions, polysilicon can be designed to ensure optimum device and integrated-circuit performance.Polycrystalline silicon has played an important role in integrated-circuit technology for two decades. It was first used in self-aligned, silicon-gate, MOS ICs to reduce capacitance and improve circuit speed. In addition to this dominant use, polysilicon is now also included in virtually all modern bipolar ICs, where it improves the basic physics of device operation. The compatibility of polycrystalline silicon with subsequent high-temperature processing allows its efficient integration into advanced IC processes. This compatibility also permits polysilicon to be used early in the fabrication process for trench isolation and dynamic random-access-memory (DRAM) storage capacitors.In addition to its integrated-circuit applications, polysilicon is becoming vital as the active layer in the channel of thin-film transistors in place of amorphous silicon. When polysilicon thin-film transistors are used in advanced active-matrix displays, the peripheral circuitry can be integrated into the same substrate as the pixel transistors. Recently, polysilicon has been used in the emerging field of microelectromechanical systems (MEMS), especially for microsensors and microactuators. In these devices, the mechanical properties, especially the stress in the polysilicon film, are critical to successful device fabrication.Polycrystalline Silicon for Integrated Circuits and Displays, Second Edition is an invaluable reference for professionals and technicians workingwith polycrystalline silicon in the integrated circuit and display industries.Springer-Verlag KG, Sachsenplatz 4-6, 1201 Wien 400 pp. Englisch.

    • Lingua: Inglese

      Editore: Springer, 2012

      1461375517 / 9781461375517

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      Da: Biblios, frankfurt am main, HESSE, GermaniaBiblios

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      EUR 308,62

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      Condizione: New. PRINT ON DEMAND pp. 402.