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Editore: Springer, 2012
ISBN 10: 3642273807ISBN 13: 9783642273803
Da: Adkins Books, Chattanooga, TN, U.S.A.
Libro
Hard cover. Condizione: Very good. Free of markings. 2013 ed.
Editore: Springer, 2012
ISBN 10: 3642273807ISBN 13: 9783642273803
Da: Mispah books, Redhill, SURRE, Regno Unito
Libro
Hardcover. Condizione: Like New. Like New. book.
Editore: Springer, 2012
ISBN 10: 3642273807ISBN 13: 9783642273803
Da: booksXpress, Bayonne, NJ, U.S.A.
Libro
Hardcover. Condizione: new.
Editore: Springer Berlin Heidelberg, 2012
ISBN 10: 3642273807ISBN 13: 9783642273803
Da: moluna, Greven, Germania
Libro Print on Demand
Gebunden. Condizione: New. Dieser Artikel ist ein Print on Demand Artikel und wird nach Ihrer Bestellung fuer Sie gedruckt. This is the most comprehensive book available on this widely used analytical techniqueThis is the most comprehensive book available on this widely used analytical techniqueIncludes supplementary material: sn.pub/extrasTo anyone who .
Editore: Springer, 2012
ISBN 10: 3642273807ISBN 13: 9783642273803
Da: Ria Christie Collections, Uxbridge, Regno Unito
Libro Print on Demand
Condizione: New. PRINT ON DEMAND Book; New; Fast Shipping from the UK. No. book.
Editore: Springer, 2012
ISBN 10: 3642273807ISBN 13: 9783642273803
Da: Lucky's Textbooks, Dallas, TX, U.S.A.
Libro
Condizione: New.
Editore: Springer Berlin Heidelberg Okt 2012, 2012
ISBN 10: 3642273807ISBN 13: 9783642273803
Da: BuchWeltWeit Ludwig Meier e.K., Bergisch Gladbach, Germania
Libro Print on Demand
Buch. Condizione: Neu. This item is printed on demand - it takes 3-4 days longer - Neuware -To anyone who is interested in surface chemical analysis of materials on the nanometer scale, this book is prepared to give appropriate information. Based on typical application examples in materials science, a concise approach to all aspects of quantitative analysis of surfaces and thin films with AES and XPS is provided. Starting from basic principles which are step by step developed into practically useful equations, extensive guidance is given to graduate students as well as to experienced researchers. Key chapters are those on quantitative surface analysis and on quantitative depth profiling, including recent developments in topics such as surface excitation parameter and backscattering correction factor. Basic relations are derived for emission and excitation angle dependencies in the analysis of bulk material and of fractional nano-layer structures, and for both smooth and rough surfaces. It is shown how to optimize the analytical strategy, signal-to-noise ratio, certainty and detection limit. Worked examples for quantification of alloys and of layer structures in practical cases (e.g. contamination, evaporation, segregation and oxidation) are used to critically review different approaches to quantification with respect to average matrix correction factors and matrix relative sensitivity factors. State-of-the-art issues in quantitative, destructive and non-destructive depth profiling are discussed with emphasis on sputter depth profiling and on angle resolved XPS and AES. Taking into account preferential sputtering and electron backscattering corrections, an introduction to the mixing-roughness-information depth (MRI) model and its extensions is presented. 548 pp. Englisch.
Editore: Springer Berlin Heidelberg, 2012
ISBN 10: 3642273807ISBN 13: 9783642273803
Da: AHA-BUCH GmbH, Einbeck, Germania
Libro
Buch. Condizione: Neu. Druck auf Anfrage Neuware - Printed after ordering - To anyone who is interested in surface chemical analysis of materials on the nanometer scale, this book is prepared to give appropriate information. Based on typical application examples in materials science, a concise approach to all aspects of quantitative analysis of surfaces and thin films with AES and XPS is provided. Starting from basic principles which are step by step developed into practically useful equations, extensive guidance is given to graduate students as well as to experienced researchers. Key chapters are those on quantitative surface analysis and on quantitative depth profiling, including recent developments in topics such as surface excitation parameter and backscattering correction factor. Basic relations are derived for emission and excitation angle dependencies in the analysis of bulk material and of fractional nano-layer structures, and for both smooth and rough surfaces. It is shown how to optimize the analytical strategy, signal-to-noise ratio, certainty and detection limit. Worked examples for quantification of alloys and of layer structures in practical cases (e.g. contamination, evaporation, segregation and oxidation) are used to critically review different approaches to quantification with respect to average matrix correction factors and matrix relative sensitivity factors. State-of-the-art issues in quantitative, destructive and non-destructive depth profiling are discussed with emphasis on sputter depth profiling and on angle resolved XPS and AES. Taking into account preferential sputtering and electron backscattering corrections, an introduction to the mixing-roughness-information depth (MRI) model and its extensions is presented.
Editore: Springer, 2012
ISBN 10: 3642273807ISBN 13: 9783642273803
Da: California Books, Miami, FL, U.S.A.
Libro
Condizione: New.
Editore: Springer Verlag, 2012
ISBN 10: 3642273807ISBN 13: 9783642273803
Da: Revaluation Books, Exeter, Regno Unito
Libro Print on Demand
Hardcover. Condizione: Brand New. 2013 edition. 547 pages. 9.25x6.00x1.00 inches. This item is printed on demand.