Isbn: 9783848409389 - design and synthesis of novel organic photo imaging compounds: design and synthesis of novel organic photo imaging compounds and their nanotechnology applications (3 risultati)

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  • Lingua: Inglese

    Editore: LAP LAMBERT Academic Publishing, 2012

    3848409380 / 9783848409389

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    Da: Mispah books, Redhill, SURRE, Regno UnitoMispah books

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    EUR 139,06

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    Paperback. Condizione: Like New. LIKE NEW. SHIPS FROM MULTIPLE LOCATIONS. book.

  • Lingua: Inglese

    Editore: LAP LAMBERT Academic Publishing, 2012

    3848409380 / 9783848409389

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    Da: moluna, Greven, Germaniamoluna

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    EUR 49,26

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    Kartoniert / Broschiert. Condizione: New. Dieser Artikel ist ein Print on Demand Artikel und wird nach Ihrer Bestellung fuer Sie gedruckt. Autor/Autorin: Vummadi Venkat ReddyDr. Venkat Reddy Vummadi born in India. He received Ph.D in 2006 from IICT, India, under the supervision of Dr. V. Jayathirtha Rao. He moved to UNCC, USA for postdoctoral studies. Later he joined at MIT, USA for .

  • Lingua: Inglese

    Editore: LAP Lambert Academic Publishing, 2012

    3848409380 / 9783848409389

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    Da: AHA-BUCH GmbH, Einbeck, GermaniaAHA-BUCH GmbH

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    EUR 84,63

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    Taschenbuch. Condizione: Neu. nach der Bestellung gedruckt Neuware - Printed after ordering - This Thesis discusses the basic principles of Lithographic techniques incorporating the use of positive and negative photoresists applications, synthetic techniques of photo imaging compounds and light sensitive materials, uses of novel chlorinating agents at mild conditions, direct esterification of sulfonicacid or salts, photochemical studies of photo activating compounds, resolution and optimization of the photo imaging compounds in nanolithographic applications. Preparative and HPLC standardization methods of photo activating compounds. Synthesis of photo acid generators for nanotechnology applications, these are used in the microelectronic industry. The microelectronic industry has made remarkable progress with the development of integrated circuit (IC) technology. Although EUV lithography at 13.5 nm wavelength has emerged as a promising candidate to meet the resolution requirements of the microelectronic industry roadmap, yet the development of advanced photoresist materials with all of the required imaging properties is still challenging and is one of the major subjects of current nanolithography research.